SCOPUS 정보 검색 플랫폼

Annual Review of Materials Science

Volumn 31, Issue , 2001, Pages 323-355

Block copolymer thin films: Physics and applications

(2) Fasolka, M J a Mayes, A M a

a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (United States)

Author keywords

Confinement; Nanoarray; Nanopattern; Self assembly; Self consistent field; Wetting

Indexed keywords

BOUNDARY CONDITIONS; COMPOSITION; MORPHOLOGY; PHYSICS; PLASTIC FILMS; SELF ASSEMBLY; SURFACE STRUCTURE; THIN FILMS; WETTING;

NANOARRAY; NANOPATTERN; SELF CONSISTENT FIELD;

BLOCK COPOLYMERS;

EID: 0035169504 PISSN: 00846600 EISSN: None Source Type: Journal
DOI: 10.1146/annurev.matsci.31.1.323 Document Type: Article

Times cited : (887)

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