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Volumn 6, Issue 8, 2009, Pages 484-489

Dependence of polymer surface roughening rate on deposited energy density during plasma processing

(8) Engelmann, Sebastian a,b Bruce, Robert L a Weilnboeck, Florian a Oehrlein, Gottlieb S a Nest, Dustin c Graves, David B c Andes, Cecily d Hudson, Eric A e

a University of Maryland (United States)

b IBM T J WATSON RESEARCH CENTER (United States)

c University of California (United States)

d ROHM AND HAAS COMPANY (United States)

e LAM RESEARCH CORPORATION (United States)

Author keywords

Energy density; Nanofabrication; Photoresists; Plasma etching; Surface roughness

Indexed keywords

ADAMANTYL GROUPS; DEPOSITED ENERGY DENSITY; ENERGY DENSITY; ETCHED NANOSTRUCTURES; NANOFABRICATION; PLASMA ETCH; PLASMA PROCESS; PLASMA PROCESSING; POLYMER STRUCTURE; POLYMER SURFACES; REMOVAL RATE; SIDEWALL ROUGHNESS; SURFACE-ROUGHENING;

FLUORINE CONTAINING POLYMERS; METAL ANALYSIS; PHOTORESISTORS; PHOTORESISTS; PLASMA ETCHING; PLASMAS; POLYMERS; SURFACE PROPERTIES; SURFACE ROUGHNESS; SURFACE TREATMENT;

AROMATIC POLYMERS;

EID: 70450215240 PISSN: 16128850 EISSN: 16128869 Source Type: Journal
DOI: 10.1002/ppap.200900004 Document Type: Article

Times cited : (25)

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