Mechanism of etching and surface relief development of PMMA under low-energy ion bombardment

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 2, 2004, Pages 843-851

  Koval, Y ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; ELECTRON BEAMS; ENERGY ABSORPTION; ENERGY DISSIPATION; ETCHING; GRAPHITIZATION; ION BOMBARDMENT; ION IMPLANTATION; MOLECULAR WEIGHT; SCANNING ELECTRON MICROSCOPY;

ELASTIC INTERACTIONS; ENERGY TRANSFORMS; HIGH-ENERGY IONS; RADIATION TRANSFORMATIONS;

POLYMETHYL METHACRYLATES;

EID: 2442528444     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1689306     Document Type: Article

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