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Volumn 43, Issue 8, 2010, Pages

Role of polymer structure and ceiling temperature in polymer roughening and degradation during plasma processing: A beam system study of P4MS and PαMS

Author keywords

[No Author keywords available]

Indexed keywords

193 NM PHOTORESISTS; BEAM SYSTEM; CEILING TEMPERATURES; CRITICAL DIMENSION; CURRENT GENERATION; DIFFERENT STRUCTURE; ION FLUENCES; MAXIMUM TEMPERATURE; NEAR SURFACE REGIONS; NEXT GENERATION LITHOGRAPHY; PLASMA PROCESSING; POLYMER CHEMISTRY; POLYMER STRUCTURE; ROOM TEMPERATURE; SPUTTER YIELDS; VUV PHOTON; VUV RADIATION;

EID: 77149163780     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/8/085204     Document Type: Article
Times cited : (12)

References (25)
  • 3
    • 77149164839 scopus 로고    scopus 로고
    • PhD Thesis University of California, Berkeley
    • Nest D 2009 PhD Thesis University of California, Berkeley
    • (2009)
    • Nest, D.1
  • 12
    • 77149131598 scopus 로고    scopus 로고
    • PhD Thesis University of California, Berkeley
    • Végh J J 2007 PhD Thesis University of California, Berkeley
    • (2007)
    • Végh, J.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.