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Volumn 43, Issue 8, 2010, Pages
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Role of polymer structure and ceiling temperature in polymer roughening and degradation during plasma processing: A beam system study of P4MS and PαMS
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Author keywords
[No Author keywords available]
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Indexed keywords
193 NM PHOTORESISTS;
BEAM SYSTEM;
CEILING TEMPERATURES;
CRITICAL DIMENSION;
CURRENT GENERATION;
DIFFERENT STRUCTURE;
ION FLUENCES;
MAXIMUM TEMPERATURE;
NEAR SURFACE REGIONS;
NEXT GENERATION LITHOGRAPHY;
PLASMA PROCESSING;
POLYMER CHEMISTRY;
POLYMER STRUCTURE;
ROOM TEMPERATURE;
SPUTTER YIELDS;
VUV PHOTON;
VUV RADIATION;
DEGRADATION;
IONS;
LITHOGRAPHY;
METAL ANALYSIS;
PHOTONS;
PHOTORESISTS;
PLASMA DEVICES;
PLASMA DIAGNOSTICS;
PLASMAS;
RADIATION EFFECTS;
SPUTTERING;
STYRENE;
SURFACE PROPERTIES;
SURFACE ROUGHNESS;
ION BOMBARDMENT;
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EID: 77149163780
PISSN: 00223727
EISSN: 13616463
Source Type: Journal
DOI: 10.1088/0022-3727/43/8/085204 Document Type: Article |
Times cited : (12)
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References (25)
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