Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposure. I. Studies of modified layer formation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 5, 2008, Pages 1637-1646

  Sumiya, M ^a   Bruce, R ^b   Engelmann, S ^b   Weilnboeck, F ^b   Oehrlein, G S ^b  

^a HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

^b UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOND FORMATIONS; ELLIPSOMETRIC DATA; ESTER GROUPS; ETCHING BEHAVIOR; ETCHING RATES; FLUORINATED SURFACE; FLUORINE CONTENTS; FLUOROCARBON FILM DEPOSITION; FLUOROCARBON PLASMAS; MODIFIED LAYER; OPTICAL MODELLING; OPTICAL-; OXYGEN CONTENTS; PLASMA EXPOSURE; SHORT TIME; SIDE CHAINS; STEADY-STATE PLASMAS; SURFACE CHEMICAL COMPOSITION; SURFACE EVOLUTIONS; SURFACE LAYERING; TIME EVOLUTIONS; TIME-RESOLVED; TWO LAYERS; TWO MATERIALS; XPS DATA; XPS MEASUREMENTS;

ABS RESINS; CHEMICAL BONDS; ESTERS; ETCHING; FLUORINE; FRICTION; METAL ANALYSIS; MOLECULAR ORBITALS; MOLECULAR SPECTROSCOPY; NONMETALS; OPTICAL CONSTANTS; OPTICAL PROPERTIES; ORGANIC COMPOUNDS; ORGANIC POLYMERS; OXYGEN; PHOTODEGRADATION; PHOTOELECTRON SPECTROSCOPY; PHOTOREFRACTIVE MATERIALS; PHOTORESISTORS; PHOTORESISTS; PLASMA DIAGNOSTICS; PLASMA INTERACTIONS; PLASMA THEORY; PLASMAS; POLYMERS; REFRACTIVE INDEX; SURFACE PROPERTIES; SURFACE ROUGHNESS; SURFACE TREATMENT; THEOREM PROVING; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACES;

EID: 53349091671     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2960561     Document Type: Article

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