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Applied Physics Letters

Volumn 94, Issue 10, 2009, Pages

Plasma impact on 193 nm photoresist linewidth roughness: Role of plasma vacuum ultraviolet light

(6) Pargon, E a Martin, M a Menguelti, K a Azarnouche, L a Foucher, J b Joubert, O a

a CNRS (France)

b CEA LETI (France)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; PHOTORESISTORS; PHOTORESISTS; PLASMA ETCHING; ROUGHNESS MEASUREMENT; SURFACE TREATMENT; ULTRAVIOLET RADIATION; VACUUM;

193 NM PHOTORESISTS; LINE-WIDTH ROUGHNESS; OPTICAL LITHOGRAPHIES; PHOTORESIST PATTERNS; PLASMA ETCHING PROCESS; PLASMA EXPOSURES; RESIST PATTERNS; STRONG CORRELATIONS; SURFACE-ROUGHENING; UNDERLAYERS; VACUUM ULTRAVIOLET LIGHTS;

PLASMAS;

EID: 62549118276 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3094128 Document Type: Article

Times cited : (42)

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