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Volumn 41, Issue 1-2, 1997, Pages 69-80

Chemical amplification resists: History and development within IBM

Author keywords

[No Author keywords available]

Indexed keywords

RANDOM ACCESS STORAGE; SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0030714728     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.411.0069     Document Type: Article
Times cited : (110)

References (60)
  • 2
    • 0023642016 scopus 로고
    • New Diazoketone Dissolution Inhibitors for Deep U. V. Photolithography
    • C. G. Willson, R. D. Miller, D. R. McKean, L. A. Pederson, and M. Regitz, "New Diazoketone Dissolution Inhibitors for Deep U. V. Photolithography," Proc. SPIE 771, 2-10 (1987).
    • (1987) Proc. SPIE , vol.771 , pp. 2-10
    • Willson, C.G.1    Miller, R.D.2    McKean, D.R.3    Pederson, L.A.4    Regitz, M.5
  • 3
    • 0019079193 scopus 로고
    • Preliminary Evaluation of Methyl Methacrylate and Acyloximino Methacrylate as Deep U. V. Resists
    • C. W. Wilkins, Jr., E. Reichmanis, and E. Chandross, "Preliminary Evaluation of Methyl Methacrylate and Acyloximino Methacrylate as Deep U. V. Resists," J. Electrochem. Soc. 127, 2510-2513 (1980).
    • (1980) J. Electrochem. Soc. , vol.127 , pp. 2510-2513
    • Wilkins Jr., C.W.1    Reichmanis, E.2    Chandross, E.3
  • 6
    • 0021698945 scopus 로고
    • Applications of Photoinitiators to the Design of Resists for Semiconductor Manufacturing
    • T. Davidson, Ed., American Chemical Society, Washington, DC
    • H. Ito and C. G. Willson, "Applications of Photoinitiators to the Design of Resists for Semiconductor Manufacturing," in ACS Symposium Series 242, Polymers in Electronics, T. Davidson, Ed., American Chemical Society, Washington, DC, 1984, pp. 11-23.
    • (1984) ACS Symposium Series 242, Polymers in Electronics , pp. 11-23
    • Ito, H.1    Willson, C.G.2
  • 9
  • 10
    • 0001677198 scopus 로고
    • Simple Negative Resist for Deep Ultraviolet, Electron Beam, and X-Ray Lithography
    • K. J. Stewart, M. Hatzakis, J. M. Shaw, D. E. Seeger, and E. Neumann, "Simple Negative Resist for Deep Ultraviolet, Electron Beam, and X-Ray Lithography," J. Vac. Sci. Technol. B 7, 1734-1739 (1989).
    • (1989) J. Vac. Sci. Technol. B , vol.7 , pp. 1734-1739
    • Stewart, K.J.1    Hatzakis, M.2    Shaw, J.M.3    Seeger, D.E.4    Neumann, E.5
  • 11
    • 0343387881 scopus 로고
    • Negative Tone Aqueous Developable Resist for Photon, Electron, and X-Ray Lithography
    • W. E. Conley, W. Moreau, S. Perreault, G. Spinillo, and R. Wood, "Negative Tone Aqueous Developable Resist for Photon, Electron, and X-Ray Lithography," Proc. SPIE 1262, 49-59 (1990).
    • (1990) Proc. SPIE , vol.1262 , pp. 49-59
    • Conley, W.E.1    Moreau, W.2    Perreault, S.3    Spinillo, G.4    Wood, R.5
  • 14
    • 0024305085 scopus 로고
    • Thermally Developable, Positive Resist Systems with High Sensitivity
    • H. Ito and R. Schwalm, "Thermally Developable, Positive Resist Systems with High Sensitivity," J. Electrochem. Soc. 136, 241-245 (1989).
    • (1989) J. Electrochem. Soc. , vol.136 , pp. 241-245
    • Ito, H.1    Schwalm, R.2
  • 15
    • 0000894495 scopus 로고
    • Highly Sensitive Thermally Developable Positive Resist Systems
    • H. Ito, M. Ueda, and R. Schwalm, "Highly Sensitive Thermally Developable Positive Resist Systems," J. Vac. Sci. Technol. B 6, 2259-2263 (1988).
    • (1988) J. Vac. Sci. Technol. B , vol.6 , pp. 2259-2263
    • Ito, H.1    Ueda, M.2    Schwalm, R.3
  • 16
    • 0042183238 scopus 로고
    • Top Surface Imaging Systems Utilizing Poly(vinylbenzoic Acid) and Its Ester
    • H. Ito, "Top Surface Imaging Systems Utilizing Poly(vinylbenzoic Acid) and Its Ester," J. Photopolym. Sci. Technol. 5, 123-140 (1992).
    • (1992) J. Photopolym. Sci. Technol. , vol.5 , pp. 123-140
    • Ito, H.1
  • 17
    • 0024071179 scopus 로고
    • Novel Polymeric Dissolution Inhibitor for the Design of Sensitive, Dry Etch Resistant, Base Developable Resist
    • H. Ito, E. Flores, and A. F. Renaldo, "Novel Polymeric Dissolution Inhibitor for the Design of Sensitive, Dry Etch Resistant, Base Developable Resist," J. Electrochem. Soc. 135, 2328-2333 (1988).
    • (1988) J. Electrochem. Soc. , vol.135 , pp. 2328-2333
    • Ito, H.1    Flores, E.2    Renaldo, A.F.3
  • 18
    • 84957134250 scopus 로고
    • Aqueous Base Developable Deep UV Resist Systems Based on Novel Monomeric and Polymeric Dissolution Inhibitors
    • H. Ito, "Aqueous Base Developable Deep UV Resist Systems Based on Novel Monomeric and Polymeric Dissolution Inhibitors," Proc. SPIE 920, 33-41 (1988).
    • (1988) Proc. SPIE , vol.920 , pp. 33-41
    • Ito, H.1
  • 20
    • 84866187013 scopus 로고    scopus 로고
    • "Positive- and Negative-Working Resist Compositions with Acid Generating Photoinitiator and Polymer with Acid Labile Groups Pendant from Polymer Backbone," U.S. Patent 4,491,628, 1985
    • H. Ito, C. G. Willson, and J. M. J. Fréchet, "Positive- and Negative-Working Resist Compositions with Acid Generating Photoinitiator and Polymer with Acid Labile Groups Pendant from Polymer Backbone," U.S. Patent 4,491,628, 1985.
    • Ito, H.1    Willson, C.G.2    Fréchet, J.M.J.3
  • 21
    • 0020799612 scopus 로고
    • Poly(p-t-butoxycarbonyloxystyrene): A Convenient Precursor to p-Hydroxystyrene Resins
    • J. M. J. Fréchet, E. Eichler, H. Ito, and C. G. Willson, "Poly(p-t-butoxycarbonyloxystyrene): A Convenient Precursor to p-Hydroxystyrene Resins," Polymer 24, 995-1000 (1983).
    • (1983) Polymer , vol.24 , pp. 995-1000
    • Fréchet, J.M.J.1    Eichler, E.2    Ito, H.3    Willson, C.G.4
  • 25
    • 0010669575 scopus 로고
    • Deep UV Resist Systems
    • J. P. Fouassier and J. E. Rabek, Eds., Elsevier, London, Ch. 11
    • H. Ito, "Deep UV Resist Systems," in Radiation Curing in Polymer Science and Technology, J. P. Fouassier and J. E. Rabek, Eds., Elsevier, London, 1993, Vol. IV, Ch. 11.
    • (1993) Radiation Curing in Polymer Science and Technology , vol.4
    • Ito, H.1
  • 26
    • 0000934974 scopus 로고
    • The Role of the Latent Images in a New Dual Image, Aqueous Developable, Thermally Stable Photoresist
    • W. E. Feeley, J. C. Imhof, C. M. Stein, T. A. Fisher, and M. W. Legenza, "The Role of the Latent Images in a New Dual Image, Aqueous Developable, Thermally Stable Photoresist," Polym. Eng. Sci. 26, 1101-1104 (1986).
    • (1986) Polym. Eng. Sci. , vol.26 , pp. 1101-1104
    • Feeley, W.E.1    Imhof, J.C.2    Stein, C.M.3    Fisher, T.A.4    Legenza, M.W.5
  • 29
    • 0343119285 scopus 로고
    • Dual Tone and Aqueous Base Developable Negative Resists Based on Acid-Catalyzed Dehydration
    • H. Ito, S. Tagawa, and K. Horie, Eds., American Chemical Society, Washington, DC
    • H. Ito and Y. Maekawa, "Dual Tone and Aqueous Base Developable Negative Resists Based on Acid-Catalyzed Dehydration," in ACS Symposium Series 579, Polymeric Materials for Microelectronic Applications, H. Ito, S. Tagawa, and K. Horie, Eds., American Chemical Society, Washington, DC, 1994, pp. 70-92.
    • (1994) ACS Symposium Series 579, Polymeric Materials for Microelectronic Applications , pp. 70-92
    • Ito, H.1    Maekawa, Y.2
  • 30
    • 0025742319 scopus 로고
    • Acid-Catalyzed Pinacol Rearrangement: Chemically Amplified Reverse Polarity Change
    • R. Sooriyakumaran, H. Ito, and E. A. Mash, "Acid-Catalyzed Pinacol Rearrangement: Chemically Amplified Reverse Polarity Change," Proc. SPIE 1466, 419-428 (1991).
    • (1991) Proc. SPIE , vol.1466 , pp. 419-428
    • Sooriyakumaran, R.1    Ito, H.2    Mash, E.A.3
  • 31
    • 3843049576 scopus 로고
    • Acid-Catalyzed Dehydration: A New Mechanism for Chemically Amplified Lithographic Imaging
    • L. F. Thompson, C. G. Willson, and S. Tagawa, Eds., American Chemical Society, Washington, DC
    • H. Ito, Y. Maekawa, R. Sooriyakumaran, and E. A. Mash, "Acid-Catalyzed Dehydration: A New Mechanism for Chemically Amplified Lithographic Imaging," in ACS Symposium Series 537, Polymers for Microelectronics: Resists and Dielectrics, L. F. Thompson, C. G. Willson, and S. Tagawa, Eds., American Chemical Society, Washington, DC, 1993, pp. 64-87.
    • (1993) ACS Symposium Series 537, Polymers for Microelectronics: Resists and Dielectrics , pp. 64-87
    • Ito, H.1    Maekawa, Y.2    Sooriyakumaran, R.3    Mash, E.A.4
  • 33
    • 0026461725 scopus 로고
    • Quantitation of Airborne Chemical Contamination of Chemically Amplified Resists Using Radiochemical Analysis
    • W. D. Hinsberg, S. A. MacDonald, N. J. Clecak, and C. D. Snyder, "Quantitation of Airborne Chemical Contamination of Chemically Amplified Resists Using Radiochemical Analysis," Proc. SPIE 1672, 24-32 (1992).
    • (1992) Proc. SPIE , vol.1672 , pp. 24-32
    • Hinsberg, W.D.1    MacDonald, S.A.2    Clecak, N.J.3    Snyder, C.D.4
  • 35
    • 17144366407 scopus 로고
    • Study on the Over-Top-Coating Suppressing Surface Insoluble Layer Generation for Chemical Amplification Resist
    • T. Kumada, Y. Tanaka, A. Ueyama, S. Kubota, H. Koezuka, T. Hanawa, and H. Morimoto, "Study on the Over-Top-Coating Suppressing Surface Insoluble Layer Generation for Chemical Amplification Resist," Proc. SPIE 1925, 31-42 (1993).
    • (1993) Proc. SPIE , vol.1925 , pp. 31-42
    • Kumada, T.1    Tanaka, Y.2    Ueyama, A.3    Kubota, S.4    Koezuka, H.5    Hanawa, T.6    Morimoto, H.7
  • 36
    • 85075978005 scopus 로고
    • Effect of Using a Resin Coating on KrF Chemically Amplified Positive Resists
    • A. Oikawa, N. Santoh, S. Miyata, Y. Hatakenaka, H. Tanaka, and K. Nakagawa, "Effect of Using a Resin Coating on KrF Chemically Amplified Positive Resists," Proc. SPIE 1925, 92-100 (1993).
    • (1993) Proc. SPIE , vol.1925 , pp. 92-100
    • Oikawa, A.1    Santoh, N.2    Miyata, S.3    Hatakenaka, Y.4    Tanaka, H.5    Nakagawa, K.6
  • 38
    • 0026477335 scopus 로고
    • Deep-UV Resists with Improved Delay Capabilities
    • D. J. H. Funhoff, H. Binder, and R. Schwalm, "Deep-UV Resists with Improved Delay Capabilities," Proc. SPIE 1672, 46-55 (1992).
    • (1992) Proc. SPIE , vol.1672 , pp. 46-55
    • Funhoff, D.J.H.1    Binder, H.2    Schwalm, R.3
  • 39
    • 33749268952 scopus 로고
    • Evaluation of a New Environmentally Stable Positive Tone Chemically Amplified Deep-UV Resist
    • W.-S. Huang, R. Kwong, A. Matnani, and M. Khojasteh, "Evaluation of a New Environmentally Stable Positive Tone Chemically Amplified Deep-UV Resist," Proc. SPIE 2195, 37-46 (1994).
    • (1994) Proc. SPIE , vol.2195 , pp. 37-46
    • Huang, W.-S.1    Kwong, R.2    Matnani, A.3    Khojasteh, M.4
  • 42
    • 0000538737 scopus 로고
    • Environmentally Stable Chemical Amplification Positive Resist; Principle, Chemistry, Contamination Resistance, and Lithographic Feasibility
    • H. Ito, G. Breyta, D. Hofer, R. Sooriyakumaran, K. Petrillo, and D. Seeger, "Environmentally Stable Chemical Amplification Positive Resist; Principle, Chemistry, Contamination Resistance, and Lithographic Feasibility," J. Photopolym. Sci. Technol. 7, 433-448 (1994).
    • (1994) J. Photopolym. Sci. Technol. , vol.7 , pp. 433-448
    • Ito, H.1    Breyta, G.2    Hofer, D.3    Sooriyakumaran, R.4    Petrillo, K.5    Seeger, D.6
  • 43
    • 0343991289 scopus 로고
    • The Annealing Concept for Environmental Stabilization of Chemical Amplification Resists
    • E. Reichmanis, C. K. Ober, S. A. MacDonald, T. Iwayanagi, and T. Nishikubo, Eds., American Chemical Society, Washington, DC
    • H. Ito, G. Breyta, D. C. Hofer, and R. Sooriyakumaran, "The Annealing Concept for Environmental Stabilization of Chemical Amplification Resists," in ACS Symposium Series 614, Microelectronics Technology: Polymers for Advanced Imaging and Packaging, E. Reichmanis, C. K. Ober, S. A. MacDonald, T. Iwayanagi, and T. Nishikubo, Eds., American Chemical Society, Washington, DC, 1995, pp. 21-34.
    • (1995) ACS Symposium Series 614, Microelectronics Technology: Polymers for Advanced Imaging and Packaging , pp. 21-34
    • Ito, H.1    Breyta, G.2    Hofer, D.C.3    Sooriyakumaran, R.4
  • 44
    • 0346226756 scopus 로고
    • Influence of Polymer Properties on Airborne Chemical Contamination of Chemically Amplified Resists
    • W. Hinsberg, S. MacDonald, N. Clecak, C. Snyder, and H. Ito, "Influence of Polymer Properties on Airborne Chemical Contamination of Chemically Amplified Resists," Proc. SPIE 1925, 43-52 (1993).
    • (1993) Proc. SPIE , vol.1925 , pp. 43-52
    • Hinsberg, W.1    MacDonald, S.2    Clecak, N.3    Snyder, C.4    Ito, H.5
  • 45
    • 0344002285 scopus 로고
    • The Lithographic Performance and Contamination Resistance of a New Family of Chemically Amplified DUV Photoresists
    • G. Breyta, D. C. Hofer, H. Ito, D. Seeger, K. Petrillo, H. Moritz, and T. Fischer, "The Lithographic Performance and Contamination Resistance of a New Family of Chemically Amplified DUV Photoresists," J. Photopolym. Sci. Technol. 7, 449-460 (1994).
    • (1994) J. Photopolym. Sci. Technol. , vol.7 , pp. 449-460
    • Breyta, G.1    Hofer, D.C.2    Ito, H.3    Seeger, D.4    Petrillo, K.5    Moritz, H.6    Fischer, T.7
  • 46
    • 0029235841 scopus 로고
    • Influence of Acid Generator Structure on T-Top Formation in High Temperature Bake Process for Environmental Stabilization
    • H. Ito, G. Breyta, D. Hofer, T. Fischer, and B. Prime, "Influence of Acid Generator Structure on T-Top Formation in High Temperature Bake Process for Environmental Stabilization," Proc. SPIE 2438, 53-60 (1995).
    • (1995) Proc. SPIE , vol.2438 , pp. 53-60
    • Ito, H.1    Breyta, G.2    Hofer, D.3    Fischer, T.4    Prime, B.5
  • 47
    • 2842567164 scopus 로고
    • Acid-Catalyzed Single-Layer Resists for ArF Lithography
    • R. R. Kunz, R. D. Allen, W. D. Hinsberg, and G. M. Wallraff, "Acid-Catalyzed Single-Layer Resists for ArF Lithography," Proc. SPIE 1925, 167-175 (1993).
    • (1993) Proc. SPIE , vol.1925 , pp. 167-175
    • Kunz, R.R.1    Allen, R.D.2    Hinsberg, W.D.3    Wallraff, G.M.4
  • 48
    • 0026438635 scopus 로고
    • Alicyclic Polymer for ArF and KrF Excimer Resist Based on Chemical Amplification
    • Y. Kaimoto, K. Nozaki, S. Takechi, and N. Abe, "Alicyclic Polymer for ArF and KrF Excimer Resist Based on Chemical Amplification," Proc. SPIE 1672, 66-77 (1992).
    • (1992) Proc. SPIE , vol.1672 , pp. 66-77
    • Kaimoto, Y.1    Nozaki, K.2    Takechi, S.3    Abe, N.4
  • 49
    • 0000875225 scopus 로고
    • High Performance Acrylic Polymers for Chemically Amplified Photoresist Applications
    • R. D. Allen, G. M. Wallraff, W. D. Hinsberg, and L. L. Simpson, "High Performance Acrylic Polymers for Chemically Amplified Photoresist Applications," J. Vac. Sci. Technol. B 9, 3357-3361 (1991).
    • (1991) J. Vac. Sci. Technol. B , vol.9 , pp. 3357-3361
    • Allen, R.D.1    Wallraff, G.M.2    Hinsberg, W.D.3    Simpson, L.L.4
  • 51
    • 0029227194 scopus 로고
    • 193-nm Single-Layer Positive Resists: Building Etch Resistance into a High-Resolution Imaging System
    • R. D. Allen, G. M. Wallraff, R. A. DiPietro, and D. C. Hofer, "193-nm Single-Layer Positive Resists: Building Etch Resistance into a High-Resolution Imaging System," Proc. SPIE 2438, 474-485 (1995).
    • (1995) Proc. SPIE , vol.2438 , pp. 474-485
    • Allen, R.D.1    Wallraff, G.M.2    DiPietro, R.A.3    Hofer, D.C.4
  • 52
    • 0029233594 scopus 로고
    • Evaluation of Chemically Amplified Resist Based on Adamantyl Methacrylate for 193 nm Lithography
    • M. Takahashi, S. Takechi, Y. Kaimoto, I. Hanyu, and N. Abe, "Evaluation of Chemically Amplified Resist Based on Adamantyl Methacrylate for 193 nm Lithography," Proc. SPIE 2438, 422-432 (1995).
    • (1995) Proc. SPIE , vol.2438 , pp. 422-432
    • Takahashi, M.1    Takechi, S.2    Kaimoto, Y.3    Hanyu, I.4    Abe, N.5
  • 53
    • 0029235844 scopus 로고
    • Positive Chemically Amplified Resist for ArF Excimer Laser Lithography Composed of a Novel Transparent Photoacid Generator and an Alicyclic Terpolymer
    • K. Nakano, K. Maeda, S. Iwasa, T. Ohfuji, and E. Hasegawa, "Positive Chemically Amplified Resist for ArF Excimer Laser Lithography Composed of a Novel Transparent Photoacid Generator and an Alicyclic Terpolymer," Proc. SPIE 2438, 433-444 (1995).
    • (1995) Proc. SPIE , vol.2438 , pp. 433-444
    • Nakano, K.1    Maeda, K.2    Iwasa, S.3    Ohfuji, T.4    Hasegawa, E.5
  • 57
    • 0001538226 scopus 로고
    • Plasma Developable Photoresist Systems Based on Chemical Amplification
    • S. A. MacDonald, H. Schlosser, H. Ito, N. Clecak, and C. G. Willson, "Plasma Developable Photoresist Systems Based on Chemical Amplification," Chem. Mater. 3, 435-442 (1991).
    • (1991) Chem. Mater. , vol.3 , pp. 435-442
    • MacDonald, S.A.1    Schlosser, H.2    Ito, H.3    Clecak, N.4    Willson, C.G.5
  • 58
    • 84866199997 scopus 로고    scopus 로고
    • "Radiation Sensitive and Oxygen Plasma Developable Resist," U.S. Patent 4,552,833, 1985
    • H. Ito, S. A. MacDonald, R. D. Miller, and C. G. Willson, "Radiation Sensitive and Oxygen Plasma Developable Resist," U.S. Patent 4,552,833, 1985.
    • Ito, H.1    MacDonald, S.A.2    Miller, R.D.3    Willson, C.G.4
  • 59
    • 0022875361 scopus 로고
    • DESIRE: A Novel Dry Developed Resist System
    • F. Coopmans and B. Roland, "DESIRE: A Novel Dry Developed Resist System," Proc. SPIE 631, 34-39 (1986).
    • (1986) Proc. SPIE , vol.631 , pp. 34-39
    • Coopmans, F.1    Roland, B.2
  • 60
    • 60849120287 scopus 로고
    • 0.25 μm Lithography Development Using Positive Mode Top Surface Imaging Photoresist
    • C. La Tulipe, J. P. Simons, D. E. Seeger, and L. L. Linehan, "0.25 μm Lithography Development Using Positive Mode Top Surface Imaging Photoresist," Proc. SPIE 2195, 372-381 (1994).
    • (1994) Proc. SPIE , vol.2195 , pp. 372-381
    • La Tulipe, C.1    Simons, J.P.2    Seeger, D.E.3    Linehan, L.L.4


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