Resist design concepts for 193 nm lithography: Opportunities for innovation and invention

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2528-2533

  Reichmanis, E ^a   Nalamasu, O ^a   Houlihan, F M ^a   Wallow, T I ^a   Timko, A G ^a   Cirelli, R ^a   Dabbagh, G ^a   Hutton, R S ^a   Novembre, A E ^a   Smith, B W ^b  

^a LUCENT TECHNOLOGIES   (United States)

^b Kate Gleason College of Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001104665     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589679     Document Type: Article

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