Quantification of line-edge roughness of photoresists. I. A comparison between off-line and on-line analysis of top-down scanning electron microscopy images

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 3, 2003, Pages 1008-1018

  Patsis, G P ^a   Constantoudis, V ^a   Tserepi, A ^a   Gogolides, E ^b  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; ATOMIC FORCE MICROSCOPY; COMPUTER SOFTWARE; IMAGE PROCESSING; SCANNING ELECTRON MICROSCOPY; SPURIOUS SIGNAL NOISE; SURFACE ROUGHNESS;

LINE EDGE ROUGHNESS (LER);

PHOTORESISTS;

EID: 0038117768     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1570845     Document Type: Review

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