Negative PMMA as a high-resolution resist - The limits and possibilities

Semiconductor Science and Technology

Volumn 12, Issue 9, 1997, Pages 1166-1170

  Hoole, A C F ^a   Welland, M E ^a   Broers, A N ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042948829     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/12/9/017     Document Type: Article

References (7)

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2. Everhart T E 1984 Materials for Microlithography (ACS Symp. Series 266) ed L F Thompson, C G Wilson and J M J Frechet, pp 5-10
3. Ziler I, Frost J E F, Chabasseurmolyneux V, Ford C J B and Pepper M 1996 Semicond. Sci. Technol. 11 1235-8
4. Broers A N 1981 J. Electrochem. Soc. 128 166-70
5. Ryan J, Hoole A C F and Broers A N 1995 J. Vac. Sci. Technol. B 13 3035-9
6. Jewett R E, Hagouel P I, Neureuther A R and van Duzer T 1997 Polym. Eng. Sci. 17 381
7. Cumming D R S, Weaver J M R, Thoms S and Beaumont S P 1996 Microelectron. Eng. 30 423-5