Etch properties of 193nm resists: Issues and approaches

Journal of Photopolymer Science and Technology

Volumn 15, Issue 3, 2002, Pages 521-527

  Padmanaban, Munirathna ^a   Alemy, Eric ^a   Dammel, Ralph ^a   Kim, Woo Kyu ^a   Kudo, Takanori ^a   Lee, Sangho ^a   Rahman, Dalil ^a   Chen, Wan Lin ^b   Sadjadi, Reza M ^b   Livesay, William ^c   Ross, Matthew ^c  

^a CLARIANT CORPORATION   (United States)

^b LAM RESEARCH CORPORATION   (United States)

^c Electron Vision Corporation

Author keywords

193nm resists; E beam curing; Etch issues

Indexed keywords

ACRYLIC ACID; ADAMANTANE; CARBONYL DERIVATIVE; METHACRYLIC ACID; NORBORNENE DERIVATIVE; POLYMER;

ARTICLE; ELECTRON BEAM; FILM; INFRARED SPECTROSCOPY; LITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTY;

EID: 0036361642     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.15.521     Document Type: Article

References (10)