Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 28, Issue 5, 2010, Pages 993-1004

  Weilnboeck, F ^a   Bruce, R L ^a   Engelmann, S ^a   Oehrlein, G S ^a   Nest, D ^b   Chung, T Y ^b   Graves, D ^b   Li, M ^c   Wang, D ^c   Andes, C ^c   Hudson, E A ^d  

^a UNIVERSITY OF MARYLAND   (United States)

^b University of California   (United States)

^c Dow Electronic Materials   (United States)

^d LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; ELECTRON BEAM LITHOGRAPHY; EMISSION SPECTROSCOPY; ESTERS; INFRARED SPECTROSCOPY; IRRADIATION; MATERIALS SCIENCE; OXYGEN; PHOTONS; PHOTORESISTS; POLYMER BLENDS; POLYMERS; RADIATION; SCANNING ELECTRON MICROSCOPY; STYRENE; SURFACE DISCHARGES; SURFACE MORPHOLOGY; SURFACE TREATMENT; ULTRAVIOLET RADIATION; VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

AR PLASMAS; CHAIN SCISSION; CHAIN-SCISSION REACTIONS; CHEMICAL CHANGE; CRITICAL DIMENSION; EMISSION CHARACTERISTICS; ESTER LINKAGES; FILM SURFACES; LINE EDGE ROUGHNESS; LOW OXYGEN; MATERIAL BULK; MATERIAL MODIFICATIONS; MORPHOLOGICAL CHANGES; OXYGEN LOSS; PATTERN TRANSFERS; PENDANT GROUPS; PHOTON FLUX; PHOTON IRRADIATION; PHOTON RADIATION; PHOTON WAVELENGTH; PLASMA CHEMISTRIES; PLASMA EXPOSURE; PLASMA PROCESS; PLASMA PROCESSING; POLYMER COMPOSITION; POLYMER STRUCTURE; RADIATION EXPOSURE; RADIATION-INDUCED; ROUGHNESS DEVELOPMENT; SPECTRAL RANGE; STRUCTURAL CHANGE; SURFACE REGION; THICKNESS REDUCTION; ULTRA-VIOLET; VACUUM TRANSFER; VACUUM ULTRAVIOLET RADIATION; VACUUM ULTRAVIOLETS; VUV EMISSION; WAVELENGTH RANGES;

PLASMAS;

EID: 77957724886     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3484249     Document Type: Article

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