Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm photoresists

Journal of Applied Physics

Volumn 105, Issue 9, 2009, Pages

  Pargon, E ^a   Menguelti, K ^a   Martin, M ^a   Bazin, A ^a   Chaix Pluchery, O ^b   Sourd, C ^c   Derrough, S ^c   Lill, T ^d   Joubert, O ^a  

^a CNRS   (France)

^b MINATEC   (France)

^c CEA LETI   (France)

^d APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

193 NM PHOTORESISTS; AR PLASMAS; CARBON ATOMS; CHARACTERIZATION TECHNIQUES; CURE TREATMENT; CUTOFF WAVELENGTHS; FOURIER; HYDROGEN DIFFUSION; PHOTORESIST FILM; PLASMA CURE; PLASMA TREATMENT; RAMAN ANALYSIS; RESIST FILMS; SYNERGISTIC EFFECT; VACUUM ULTRAVIOLET LIGHT; VUV LIGHT;

CHEMICAL MODIFICATION; CURING; ELLIPSOMETRY; ESTERS; GRAPHITE; HYDROGEN; INFRARED SPECTROSCOPY; ION BOMBARDMENT; IONS; METAL RECOVERY; PHOTORESISTORS; PHOTORESISTS; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMAS;

EID: 67249092120     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3116504     Document Type: Article

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