Deposition control for reduction of 193 nm photoresist degradation in dielectric etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 1, 2005, Pages 217-223

  Negishi, N ^a   Takesue, H ^b   Sumiya, M ^a   Yoshida, T ^b   Momonoi, Y ^a   Izawa, M ^a  

^a HITACHI LTD   (Japan)

^b HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEGRADATION; DEPOSITION; ELECTRON CYCLOTRON RESONANCE; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY; SURFACE CHEMISTRY; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION CONTROL; PHOTORESIST DEGRADATION;

PHOTORESISTORS;

EID: 31144455621     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1849218     Document Type: Article

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