The effect of photoresist/topcoat properties on defect formation in immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Wallraff, G M ^a   Larson, C E ^a   Breyta, G ^a   Sundberg, L ^a   Miller, D ^a   Gil, D ^b   Petrillo, K ^b   Pierson, W ^c  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b IBM   (United States)

^c ASML   (Netherlands)

Author keywords

Chemically amplified resist; Defects; Immersion lithography; Water spots

Indexed keywords

CHEMICALLY AMPLIFIED RESIST; IMMERSION LITHOGRAPHY; WATER SPOTS;

DEFECTS; ELECTRIC CURRENTS; LITHOGRAPHY; OPTICS; PRECIPITATION (CHEMICAL); SURFACES; WATERMARKING;

PHOTORESISTS;

EID: 33745610916     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.657179     Document Type: Conference Paper

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