Properties of c-C4F8 inductively coupled plasmas. II. Plasma chemistry and reaction mechanism for modeling of Ar/c-C 4F8/O2 discharges

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 3, 2004, Pages 511-530

  Vasenkov, Alex V ^a,c   Li, Xi ^b   Oehrlein, Gottlieb S ^b   Kushner, Mark J ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b UNIVERSITY OF MARYLAND   (United States)

^c CFD RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CARBON MONOXIDE; CARRIER CONCENTRATION; CHLOROFLUOROCARBONS; COMPLEXATION; IONS; MAGNETIC FIELDS; MATHEMATICAL MODELS; MIXTURES; PLASMA DENSITY; PLASMA THEORY; PRESSURE EFFECTS; REACTION KINETICS;

COMPLEX CHEMISTRY; GAS MIXTURES; ION SATURATION; MAGNETIC CONFINEMENT;

INDUCTIVELY COUPLED PLASMA;

EID: 3142585339     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1697483     Document Type: Article

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