Increasing plasma etch resistance of resists using fullerene additives

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2575-2581

  Dentinger, Paul M ^a   Taylor, James W ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIVES; DURABILITY; PHOTORESISTS; PLASMA ETCHING; PLASMAS; POLYMETHYL METHACRYLATES; POLYSTYRENES; SOLUBILITY; STABILITY;

FLUORINATED FULLERENE; NOVOLAC RESINS; PLASMA ETCH RESISTANCE;

FULLERENES;

EID: 0031270059     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589688     Document Type: Article

References (30)