Dual nanoscale roughness on plasma-etched Si surfaces: Role of etch inhibitors

Physical Review B - Condensed Matter and Materials Physics

Volumn 76, Issue 19, 2007, Pages

  Kokkoris, G ^a   Constantoudis, V ^a   Angelikopoulos, P ^a   Boulousis, G ^a   Gogolides, E ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36148956244     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.76.193405     Document Type: Article

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