메뉴 건너뛰기




Volumn 99, Issue 7, 1999, Pages 1801-1821

Lithographic Imaging Techniques for the Formation of Nanoscopic Features

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0001001627     PISSN: 00092665     EISSN: None     Source Type: Journal    
DOI: 10.1021/cr980003i     Document Type: Article
Times cited : (497)

References (150)
  • 8
    • 0008568163 scopus 로고
    • Lithographic Technical Foundation: New York
    • Hartsuch, P. Chemistry of Lithography; Lithographic Technical Foundation: New York, 1961.
    • (1961) Chemistry of Lithography
    • Hartsuch, P.1
  • 11
    • 0003937505 scopus 로고
    • Tutorial Texts in Optical Engineering, v. TT 11; SPIE Optical Engineering Press: Bellingham, WA
    • (a) Dammel, R. Diazonaphthoquinone-based Resists; Tutorial Texts in Optical Engineering, v. TT 11; SPIE Optical Engineering Press: Bellingham, WA, 1993.
    • (1993) Diazonaphthoquinone-based Resists
    • Dammel, R.1
  • 12
    • 0004093537 scopus 로고
    • ACS Professional Reference book; Americian Chemical Society, Washington, DC, Chapter 3
    • (b) Willson, C. G. Introduction to Microlithography, 2nd ed.; ACS Professional Reference book; Americian Chemical Society, Washington, DC, 1994; Chapter 3.
    • (1994) Introduction to Microlithography, 2nd Ed.
    • Willson, C.G.1
  • 15
    • 0006371330 scopus 로고
    • Diazonaphthoquinone-based Resists
    • SPIE Optical Engineering Press: Bellingham, WA
    • Dammel, R. Diazonaphthoquinone-based Resists; Tutorial Texts in Optical Engineering, v. TT 11; SPIE Optical Engineering Press: Bellingham, WA, 1993; p 15.
    • (1993) Tutorial Texts in Optical Engineering , vol.TT 11 , pp. 15
    • Dammel, R.1
  • 19
    • 0001802652 scopus 로고
    • Polymers in Microlithography; Reichmanis, E., MacDonald, S., Iwayanagi, T., Eds.; Americian Chemical Society; Washington, DC
    • McKean, D.; Schaedili, U.; MacDonald, S. In Polymers in Microlithography; ACS Symposium Series 412; Reichmanis, E., MacDonald, S., Iwayanagi, T., Eds.; Americian Chemical Society; Washington, DC, 1989; p 27.
    • (1989) ACS Symposium Series , vol.412 , pp. 27
    • McKean, D.1    Schaedili, U.2    MacDonald, S.3
  • 20
    • 0003946123 scopus 로고
    • Polymeric Materials for Microelectronic Applications; Ito, H., Tagawa, S., Horie K., Eds.; Americian Chemical Society: Washington, DC
    • Ito, H.; Maekawa, Y. In Polymeric Materials for Microelectronic Applications; ACS Symposium Series 529; Ito, H., Tagawa, S., Horie K., Eds.; Americian Chemical Society: Washington, DC, 1994; p 70.
    • (1994) ACS Symposium Series , vol.529 , pp. 70
    • Ito, H.1    Maekawa, Y.2
  • 23
    • 0346367235 scopus 로고
    • See, however: Ito, H. Proc. SPIE 1992, 1672, 94.
    • (1992) Proc. SPIE , vol.1672 , pp. 94
    • Ito, H.1
  • 25
    • 0346997089 scopus 로고
    • Polymers for Microelectronics; Thompson, L. F.. Willson, C. G., Tagawa, S., Eds.; Americian Chemical Society: Washington, DC, Chapter 11
    • (a) Allen, R.; Wallraff, G.; Hinsberg, W.; Simpson, L.; Kunz, R. In Polymers for Microelectronics; ACS Symposium Series 537; Thompson, L. F.. Willson, C. G., Tagawa, S., Eds.; Americian Chemical Society: Washington, DC, 1994; Chapter 11.
    • (1994) ACS Symposium Series , vol.537
    • Allen, R.1    Wallraff, G.2    Hinsberg, W.3    Simpson, L.4    Kunz, R.5
  • 44
    • 3843058258 scopus 로고    scopus 로고
    • Rai-Choudhury, P., Ed.; SPIE Optical Engineering Press: Bellingham, WA, Chapter 7. Simulations were performed using the SAMPLE program (available from UC Berkeley, Department of Electrical Engineering)
    • For a review of optical lithography modeling, see: Neureuther, A.; Mack, C. In Handbook of Microlithography, Micromachining, and Microfabrication; Rai-Choudhury, P., Ed.; SPIE Optical Engineering Press: Bellingham, WA, 1997; Vol. 1, Chapter 7. Simulations were performed using the SAMPLE program (available from UC Berkeley, Department of Electrical Engineering).
    • (1997) Handbook of Microlithography, Micromachining, and Microfabrication , vol.1
    • Neureuther, A.1    Mack, C.2
  • 45
    • 0004093537 scopus 로고
    • ACS Professional Reference book; Americian Chemical Society: Washington, DC, Chapter 2
    • Bowden, M. J. Introduction to Microlithography, 2nd ed.; ACS Professional Reference book; Americian Chemical Society: Washington, DC, 1994; Chapter 2.
    • (1994) Introduction to Microlithography, 2nd Ed.
    • Bowden, M.J.1
  • 52
    • 0026140283 scopus 로고
    • Schlegel, L.; Ueno, T.; Shiraishi, H.; Iwayanagi, T. Chem. Mater. 1990, 2, 299. Hacker; N. P.; Welsh, K. M. Macromolecules 1991, 24, 2137.
    • (1991) Macromolecules , vol.24 , pp. 2137
    • Hacker, N.P.1    Welsh, K.M.2
  • 55
    • 0000854458 scopus 로고
    • Guillet, J. In Polymer Photophysics and Photochemistry; Cambridge University Press: Cambridge, UK, 1985; Chapter 9. Webber, S. E. Chem. Rev. 1990, 90, 1469.
    • (1990) Chem. Rev. , vol.90 , pp. 1469
    • Webber, S.E.1
  • 72
    • 0346997081 scopus 로고
    • Materials for Microlithography; Thompson, L., Willson, G., Frechet, J., Eds.; American Chemical Society: Washington, DC, Chapter 2
    • Broers, A. In Materials for Microlithography; ACS Symposium Series 266; Thompson, L., Willson, G., Frechet, J., Eds.; American Chemical Society: Washington, DC, 1984; Chapter 2.
    • (1984) ACS Symposium Series , vol.266
    • Broers, A.1
  • 79
    • 0345736034 scopus 로고
    • Materials for Microlithography; Thompson, L., Willson, G., Frechet, J., Eds.; American Chemical Society: Washington, DC, Chapter 3
    • Bowden, M. In Materials for Microlithography; ACS Symposium Series 266; Thompson, L., Willson, G., Frechet, J., Eds.; American Chemical Society: Washington, DC, 1984; Chapter 3.
    • (1984) ACS Symposium Series , vol.266
    • Bowden, M.1
  • 98
    • 0004093537 scopus 로고
    • ACS Professional Reference book; Americian Chemical Society: Washington, DC, Chapter 2
    • Bowden, M. J. In Introduction to Microlithography, 2nd ed.; ACS Professional Reference book; Americian Chemical Society: Washington, DC, 1994; Chapter 2. Henke, B. L.; Gullikson, E. M.; Davis, J. C. At. Data Nucl. Data Tables 1993, 54, 181.
    • (1994) Introduction to Microlithography, 2nd Ed.
    • Bowden, M.J.1
  • 99
    • 0004932883 scopus 로고
    • Bowden, M. J. In Introduction to Microlithography, 2nd ed.; ACS Professional Reference book; Americian Chemical Society: Washington, DC, 1994; Chapter 2. Henke, B. L.; Gullikson, E. M.; Davis, J. C. At. Data Nucl. Data Tables 1993, 54, 181.
    • (1993) At. Data Nucl. Data Tables , vol.54 , pp. 181
    • Henke, B.L.1    Gullikson, E.M.2    Davis, J.C.3
  • 100
    • 0029226228 scopus 로고
    • Wheeler, D.; Hutton, R.; Boyce, C.; Stein, S.; Cirelli, R.; Taylor, G. Proc. SPIE 1995, 2438, 762. Rao, V.; Hutchinson, J.; Holl, S.; Langston, J.; Henderson, C.; Wheeler, D. R.; Cardinale, G.; O'Connell, D.; Goldsmith, J.; Bohland, J.; Taylor, G.; Sinta, R. J. Vac. Sci. Technol. B 1998, 16, 3722. Henderson, C. C.; Wheeler, D.; Pollagi, T.; Cardinale, G.; O'Connell, D.; Fisher, A.; Rao, V.; Goldsmith, J. J. Photopolym. Sci. Technol. 1998, 11, 459.
    • (1995) Proc. SPIE , vol.2438 , pp. 762
    • Wheeler, D.1    Hutton, R.2    Boyce, C.3    Stein, S.4    Cirelli, R.5    Taylor, G.6
  • 102
    • 0001370606 scopus 로고    scopus 로고
    • Wheeler, D.; Hutton, R.; Boyce, C.; Stein, S.; Cirelli, R.; Taylor, G. Proc. SPIE 1995, 2438, 762. Rao, V.; Hutchinson, J.; Holl, S.; Langston, J.; Henderson, C.; Wheeler, D. R.; Cardinale, G.; O'Connell, D.; Goldsmith, J.; Bohland, J.; Taylor, G.; Sinta, R. J. Vac. Sci. Technol. B 1998, 16, 3722. Henderson, C. C.; Wheeler, D.; Pollagi, T.; Cardinale, G.; O'Connell, D.; Fisher, A.; Rao, V.; Goldsmith, J. J. Photopolym. Sci. Technol. 1998, 11, 459.
    • (1998) J. Photopolym. Sci. Technol. , vol.11 , pp. 459
    • Henderson, C.C.1    Wheeler, D.2    Pollagi, T.3    Cardinale, G.4    O'Connell, D.5    Fisher, A.6    Rao, V.7    Goldsmith, J.8
  • 109
    • 0343176807 scopus 로고    scopus 로고
    • Levenson, M. D. Proc. SPIE 1997, 3049, 2. Khan, M.; Bollepalli, S.; Cerina, F. J. Vac. Sci. Technol. B 1997, 15, 2255.
    • (1997) Proc. SPIE , vol.3049 , pp. 2
    • Levenson, M.D.1
  • 121
    • 33749268952 scopus 로고    scopus 로고
    • Huang, W. S.; Kwong, R.; Katnani, A.; Khojasteh, M. Proc. SPIE 1994, 2195, 37. Schacht, H. T.; Muenzrl, N.; Falcigno, P.; Holzwarth, H.; Schneider, J. J. Photopolym. Sci. Technol. 1996, 9, 445.
    • (1994) Proc. SPIE , vol.2195 , pp. 37
    • Huang, W.S.1    Kwong, R.2    Katnani, A.3    Khojasteh, M.4
  • 123
    • 0006371330 scopus 로고
    • Diazonaphthoquinone-based Resists
    • SPIE Optical Engineering Press: Bellingham, WA, Chapter 2
    • Dammel, R. Diazonaphthoquinone-based Resists; Tutorial Texts in Optical Engineering, v. TT 11; SPIE Optical Engineering Press: Bellingham, WA, 1993; Chapter 2.
    • (1993) Tutorial Texts in Optical Engineering , vol.TT 11
    • Dammel, R.1
  • 132
    • 0002838502 scopus 로고
    • Microlectronics Technology, Polymers for Advanced Imaging and Packaging; Reichmanis, E., Ober, C., MacDonald, S., Iwayanagi, T., Nishikubo, T., Eds.; American Chemical Society: Washington, DC
    • Thackaray, J. W.; Denision, M. D.; Fedynyshyun, T. H.; Kang, D.; Sinta, R. In Microlectronics Technology, Polymers for Advanced Imaging and Packaging; ACS Symposium Series 614; Reichmanis, E., Ober, C., MacDonald, S., Iwayanagi, T., Nishikubo, T., Eds.; American Chemical Society: Washington, DC, 1995; p 84.
    • (1995) ACS Symposium Series , vol.614 , pp. 84
    • Thackaray, J.W.1    Denision, M.D.2    Fedynyshyun, T.H.3    Kang, D.4    Sinta, R.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.