Modelling vacuum ultraviolet photon penetration depth and C=O bond depletion in 193 nm photoresist

Journal of Physics D: Applied Physics

Volumn 42, Issue 15, 2009, Pages

  Titus, Monica J ^a   Nest, Dustin G ^a   Graves, David B ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

193 NM PHOTORESISTS; BOND-BREAKING; BULK CHEMICAL COMPOSITION; C-C BONDS; CARBON-OXYGEN BONDS; FOURIER TRANSFORM INFRARED; INCIDENT RADIATION; MODEL-BASED; NEAR-SURFACE; PHOTOABSORPTIONS; TRANSMISSION MEASUREMENTS; VACUUM ULTRAVIOLETS; VUV PHOTON;

CHEMICAL BONDS; OXYGEN; PHOTORESISTORS; PHOTORESISTS; SURFACE TREATMENT; VACUUM;

PHOTONS;

EID: 70149092945     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/15/152001     Document Type: Article

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