Absolute intensities of the vacuum ultraviolet spectra in oxide etch plasma processing discharges

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 19, Issue 1, 2001, Pages 45-55

  Woodworth, J R ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; OXIDES; PHOTONS; SILICON WAFERS; SPECTROMETERS; ULTRAVIOLET SPECTROSCOPY; VACUUM APPLICATIONS;

GASEOUS ELECTRONICS CONFERENCE REFERENCE CELL; VACUUM ULTRAVIOLET SPECTRA;

PLASMA ETCHING;

EID: 0035109215     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1335685     Document Type: Article

References (2)

1. G. S. Oehrlein, Mater. Sci. Eng., B 4, 441 (1989).
2. K. H. Ryden, H. Norstrom, C. Nender, and S. Berg, J. Electrochem. Soc. 134,3113 (1987).