-
2
-
-
33745617811
-
-
S. C. Palmateer, S. G. Cann, J. E. Curtin, S. P. Doran, L. M. Eriksen, A. R. Forte, R. R. Kunz, T. M. Lyszczarz, M. B. Stern, C. Nelson, SPIE Vol. 3333, 634, 1998.
-
(1998)
SPIE
, vol.3333
, pp. 634
-
-
Palmateer, S.C.1
Cann, S.G.2
Curtin, J.E.3
Doran, S.P.4
Eriksen, L.M.5
Forte, A.R.6
Kunz, R.R.7
Lyszczarz, T.M.8
Stern, M.B.9
Nelson, C.10
-
3
-
-
0141722620
-
-
B. Ho, D. Guenther, M. Cheng, K. Sotoodeh, A. Rudack, R. Yamaguchi, B. Brown, M. Ickes, K. Nafus, SPIE Vol. 5039, 1229, 2003.
-
(2003)
SPIE
, vol.5039
, pp. 1229
-
-
Ho, B.1
Guenther, D.2
Cheng, M.3
Sotoodeh, K.4
Rudack, A.5
Yamaguchi, R.6
Brown, B.7
Ickes, M.8
Nafus, K.9
-
4
-
-
11744356176
-
-
V. Rao, J. Hutchinson, S. Holl, J. Langtom, C. Henderson, D.R. Wheeler, G. Cardinale, D. O' Connell, J. Goldsmith, J. Bohland, G. Taylor, R. Sinta,J. Vac. Sci. Technol. B 16, 3722, 1988.
-
(1988)
J. Vac. Sci. Technol. B
, vol.16
, pp. 3722
-
-
Rao, V.1
Hutchinson, J.2
Holl, S.3
Langtom, J.4
Henderson, C.5
Wheeler, D.R.6
Cardinale, G.7
O'Connell, D.8
Goldsmith, J.9
Bohland, J.10
Taylor, G.11
Sinta, R.12
-
5
-
-
0040114843
-
-
H.H. Solak, D. He, W. Li, F. Cerrina, J. Vac. Sci. Technol. B 17, 3052, 1999.
-
(1999)
J. Vac. Sci. Technol. B
, vol.17
, pp. 3052
-
-
Solak, H.H.1
He, D.2
Li, W.3
Cerrina, F.4
-
7
-
-
33745634244
-
-
U.S. Patent 4,491,628
-
H. Ito, C.G. Willson, J.M.J.Frechet, U.S. Patent 4,491,628 (1985).
-
(1985)
-
-
Ito, H.1
Willson, C.G.2
Frechet, J.M.J.3
-
8
-
-
0026203822
-
-
A. A. Lamola, C. R. Szmanda, and J. W. Thackeray, Solid State Technol., 34(8), 53 (1991).
-
(1991)
Solid State Technol.
, vol.34
, Issue.8
, pp. 53
-
-
Lamola, A.A.1
Szmanda, C.R.2
Thackeray, J.W.3
-
9
-
-
0141722730
-
Influence of film thickness, molecular weight, and substrate on the physical properties of photoresist polymer thin films
-
L. Singh, P. J. Ludovice, C. L. Henderson, "Influence of film thickness, molecular weight, and substrate on the physical properties of photoresist polymer thin films", Proc. SPIE Vol. 5039, p. 1008-1018, 2003.
-
(2003)
Proc. SPIE
, vol.5039
, pp. 1008-1018
-
-
Singh, L.1
Ludovice, P.J.2
Henderson, C.L.3
-
10
-
-
24644451499
-
The effect of film thickness on the dissolution rate and hydrogen bonding behavior of photoresist polymer thin films
-
May
-
L. Singh, P. J. Ludovice, C. L. Henderson, "The effect of film thickness on the dissolution rate and hydrogen bonding behavior of photoresist polymer thin films", Proceedings of SPIE -Volume 5753 Advances in Resist Technology and Processing XXII, May 2005, pp. 319-328
-
(2005)
Proceedings of SPIE -volume 5753 Advances in Resist Technology and Processing XXII
, vol.5753
, pp. 319-328
-
-
Singh, L.1
Ludovice, P.J.2
Henderson, C.L.3
-
11
-
-
3843100285
-
Effect of nanoscale confinement on the diffusion behavior of photoresist polymer thin films
-
L. Singh, P. J. Ludovice, and C. L. Henderson, "Effect of nanoscale confinement on the diffusion behavior of photoresist polymer thin films", Proceedings of SPIE-The International Society for Optical Engineering, vol. 5376, pp. 369-378, 2004.
-
(2004)
Proceedings of SPIE-the International Society for Optical Engineering
, vol.5376
, pp. 369-378
-
-
Singh, L.1
Ludovice, P.J.2
Henderson, C.L.3
-
12
-
-
3843135062
-
Effect of film thickness on the dissolution rate behavior of photoresist polymer thin films
-
L. Singh, P. J. Ludovice, and C. L. Henderson, "Effect of film thickness on the dissolution rate behavior of photoresist polymer thin films", Proceedings of SPIE-The International Society for Optical Engineering, vol. 5376, pp. 1007-1016, 2004.
-
(2004)
Proceedings of SPIE-the International Society for Optical Engineering
, vol.5376
, pp. 1007-1016
-
-
Singh, L.1
Ludovice, P.J.2
Henderson, C.L.3
-
13
-
-
33745584487
-
Line edge roughness and intrinsic bias for two methacrylate polymer resist systems
-
Submitted
-
A. R. Pawloski, A. Acheta, H. J. Levinson, T. B. Michaelson, A. Jamieson, Y. Nishimura, C. G. Willson, "Line Edge Roughness and Intrinsic Bias for Two Methacrylate Polymer Resist Systems", Submitted Journal of Microlithography, Microfabrication, and Microsystems (2005).
-
(2005)
Journal of Microlithography, Microfabrication, and Microsystems
-
-
Pawloski, A.R.1
Acheta, A.2
Levinson, H.J.3
Michaelson, T.B.4
Jamieson, A.5
Nishimura, Y.6
Willson, C.G.7
-
14
-
-
3843151399
-
Characterization of line edge roughness in photoresist using an image fading technique
-
A. R. Pawloski, A. Acheta, I. Lalović, B. La Fontaine, H. J. Levinson, "Characterization of line edge roughness in photoresist using an image fading technique", SPIE Vol. 5376, 414, 2004.
-
(2004)
SPIE
, vol.5376
, pp. 414
-
-
Pawloski, A.R.1
Acheta, A.2
Lalović, I.3
La Fontaine, B.4
Levinson, H.J.5
-
15
-
-
84858911979
-
-
"Method of using amorphous carbon to prevent resist poisoning", United States Patent 6855627
-
S. Dakshina-Murthy, S. Bell, R. J. Huang, R. C. Nguyen. C. Tabery, "Method of using amorphous carbon to prevent resist poisoning", United States Patent 6855627, 2005.
-
(2005)
-
-
Dakshina-Murthy, S.1
Bell, S.2
Huang, R.J.3
Nguyen, R.C.4
Tabery, C.5
|