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Volumn 6153 I, Issue , 2006, Pages

Effect of top coat and resist thickness on line edge roughness

Author keywords

LER; Resist Thickness; Substrate Interaction; Top Coat

Indexed keywords

IMMERSION LITHOGRAPHY; LINE EDGE ROUGHNESS (LER); RESIST THICKNESS; SUBSTRATE INTERACTION; TOP COAT;

EID: 33745613842     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655925     Document Type: Conference Paper
Times cited : (14)

References (15)
  • 9
    • 0141722730 scopus 로고    scopus 로고
    • Influence of film thickness, molecular weight, and substrate on the physical properties of photoresist polymer thin films
    • L. Singh, P. J. Ludovice, C. L. Henderson, "Influence of film thickness, molecular weight, and substrate on the physical properties of photoresist polymer thin films", Proc. SPIE Vol. 5039, p. 1008-1018, 2003.
    • (2003) Proc. SPIE , vol.5039 , pp. 1008-1018
    • Singh, L.1    Ludovice, P.J.2    Henderson, C.L.3
  • 14
    • 3843151399 scopus 로고    scopus 로고
    • Characterization of line edge roughness in photoresist using an image fading technique
    • A. R. Pawloski, A. Acheta, I. Lalović, B. La Fontaine, H. J. Levinson, "Characterization of line edge roughness in photoresist using an image fading technique", SPIE Vol. 5376, 414, 2004.
    • (2004) SPIE , vol.5376 , pp. 414
    • Pawloski, A.R.1    Acheta, A.2    Lalović, I.3    La Fontaine, B.4    Levinson, H.J.5
  • 15
    • 84858911979 scopus 로고    scopus 로고
    • "Method of using amorphous carbon to prevent resist poisoning", United States Patent 6855627
    • S. Dakshina-Murthy, S. Bell, R. J. Huang, R. C. Nguyen. C. Tabery, "Method of using amorphous carbon to prevent resist poisoning", United States Patent 6855627, 2005.
    • (2005)
    • Dakshina-Murthy, S.1    Bell, S.2    Huang, R.J.3    Nguyen, R.C.4    Tabery, C.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.