Surface processes in low pressure plasmas

Surface Science

Volumn 386, Issue 1-3, 1997, Pages 222-230

  Oehrlein, Gottlieb S ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

Dry etching; Fluorocarbon; Plasma etching; Plasma surface interactions; Reactive ion etching; Sidewall passivation; Silicon; Surface analysis

Indexed keywords

DRY ETCHING; FLUOROCARBONS; ION BOMBARDMENT; MICROELECTRONIC PROCESSING; PASSIVATION; PLASMA INTERACTIONS; REACTIVE ION ETCHING; SURFACE PHENOMENA;

LOW PRESSURE PLASMAS;

PLASMA ETCHING;

EID: 0031248332     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(97)00304-X     Document Type: Article

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