High density fluorocarbon plasma etching of new resists suitable for nano-imprint lithography

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 501-505

  Gaboriau, F ^a   Peignon, M C ^a   Barreau, A ^a,b   Turban, G ^a   Cardinaud, Ch ^a   Pfeiffer, K ^c   Bleidiessel G ^c   Grutzner G ^c  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

^b UNIVERSITÉ DE NANTES   (France)

^c MICRO RESIST TECHNOLOGY GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FLUOROCARBONS; NANOTECHNOLOGY; PLASMA DENSITY; PLASMA ETCHING; POLYMERS; SCANNING ELECTRON MICROSCOPY; SILICA;

NANOIMPRINT LITHOGRAPHY; POLYMETHYLACRYLATE;

PHOTOLITHOGRAPHY;

EID: 0034205422     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00365-8     Document Type: Article

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