Reduction of line edge roughness in the top surface imaging process

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3739-3747

  Mori, Shigeyasu ^a,b   Morisawa, Taku ^a   Matsuzawa, Nobuyuki ^a   Kaimoto, Yuko ^a   Endo, Masayuki ^a   Matsuo, Takahiro ^a   Kuhara, Koichi ^a   Sasago, Masaru ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b SHARP CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11744386910     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590409     Document Type: Article

References (11)

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