Imprint lithography with 25-nanometer resolution

Science

Volumn 272, Issue 5258, 1996, Pages 85-87

  Chou, Stephen Y ^a   Krauss, Peter R ^a   Renstrom, Preston J ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSION MOLDING; ETCHING; INTEGRATED CIRCUIT MANUFACTURE; NANOTECHNOLOGY; POLYCARBONATES; POLYESTERS; POLYMETHYL METHACRYLATES; PRINTING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; THIN FILMS;

IMPRINT LITHOGRAPHY; LIFT OFF PROCESS; NANODEVICES; NANOMETER RESOLUTION; PATTERN TRANSFER PROCESS;

LITHOGRAPHY;

EID: 0030570065     PISSN: 00368075     EISSN: None     Source Type: Journal    
DOI: 10.1126/science.272.5258.85     Document Type: Article

References (11)

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11. We thank other members of the NanoStructure Laboratory whose efforts have profoundly affected the current work S Y.C thanks W T Peria for suggesting the term thickness-contrast lithography as an alternative name for imprint lithography Supported in part by the Packard Foundation through a Packard fellowship