High power impulse magnetron sputtering discharge

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 3, 2012, Pages

  Gudmundsson, J T ^a,b   Brenning, N ^c   Lundin, D ^d   Helmersson, U ^d  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b UNIVERSITY OF ICELAND   (Iceland)

^c ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^d LINKÖPING UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

AVERAGE POWER; CONVENTIONAL DC MAGNETRON SPUTTERING; DISCHARGE PROCESS; DISCHARGE PROPERTIES; ELECTRON ENERGIES; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); HIGH-IONIZATION; HIGH-POWER; ION ENERGIES; ION FLUXES; IONIZED PHYSICAL VAPOR DEPOSITION; LOW DUTY-CYCLES; NEUTRAL SPECIES; ORDERS OF MAGNITUDE; PEAK POWER; PLASMA COMPOSITION; PLASMA PARAMETER; PULSED POWER SUPPLY; REPETITION FREQUENCY; SPUTTERING TECHNOLOGY; UNDERLYING MECHANISM; UNIPOLAR PULSE;

FILM GROWTH; INDUSTRIAL APPLICATIONS; IONIZATION; MAGNETRON SPUTTERING; PLASMA DENSITY;

VAPORS;

EID: 84864265583     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3691832     Document Type: Review

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