High power impulse magnetron sputtering using a rotating cylindrical magnetron

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 28, Issue 1, 2010, Pages 108-111

  Leroy, W P ^a   Mahieu, S ^a   Depla, D ^a   Ehiasarian, A P ^b  

^a GHENT UNIVERSITY   (Belgium)

^b SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION TECHNIQUE; DIRECT CURRENT; HIGH-POWER; HIGHER-DEGREE; PLASMA REGION; STABLE OPERATION;

ROTATION;

MAGNETRONS;

EID: 73849148251     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3271136     Document Type: Article

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