Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide

Surface and Coatings Technology

Volumn 205, Issue 20, 2011, Pages 4828-4831

  Aiempanakit, Montri ^a   Helmersson, Ulf ^a   Aijaz, Asim ^a   Larsson, Petter ^a   Magnusson, Roger ^a   Jensen, Jens ^a   Kubart, Tomáš ^b,c  

^a LINKÖPING UNIVERSITY   (Sweden)

^b UPPSALA UNIVERSITY   (Sweden)

^c CZECH TECHNICAL UNIVERSITY IN PRAGUE   (Czech Republic)

Author keywords

Anatase; HiPIMS; Reactive sputtering; Rutile; TiO2; Titanium dioxide

Indexed keywords

ANATASE; AVERAGE POWER; COATING PROPERTIES; DIRECT CURRENT MAGNETRON SPUTTERING; FILM PROPERTIES; HIGH-POWER; HIPIMS; ION ENERGY DISTRIBUTIONS; PEAK POWER; POST DEPOSITION ANNEALING; PROCESS CONDITION; PULSE ON-TIME; REACTIVE DEPOSITION; ROOM TEMPERATURE; RUTILE; RUTILE PHASIS; SPUTTERED MATERIALS; SUBSTRATE HEATING; TIO; TIO2;

DEPOSITION RATES; ELECTRIC POWER DISTRIBUTION; MAGNETRON SPUTTERING; OXIDE MINERALS; PLASMA SOURCES; REFRACTIVE INDEX; TITANIUM;

TITANIUM DIOXIDE;

EID: 79957659422     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.04.071     Document Type: Article

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