Ionized physical vapor deposition (IPVD): A review of technology and applications

Thin Solid Films

Volumn 513, Issue 1-2, 2006, Pages 1-24

  Helmersson, Ulf ^a   Lattemann, Martina ^a   Bohlmark, Johan ^a   Ehiasarian, Arutiun P ^b   Gudmundsson, Jon Tomas ^c  

^a LINKÖPING UNIVERSITY   (Sweden)

^b SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

^c UNIVERSITY OF ICELAND   (Iceland)

Author keywords

Arc evaporation; Ionized physical vapor deposition; Plasma processing and deposition; Sputtering

Indexed keywords

CATHODES; DEPOSITION; EVAPORATION; IONIZATION; MAGNETRON SPUTTERING; MICROSTRUCTURE; MICROWAVES; PLASMAS;

ARC-EVAPORATION; IONIZED PHYSICAL VAPOR DEPOSITION (IPVD); PLASMA PROCESSING AND DEPOSITION;

VAPOR DEPOSITION;

EID: 33746937174     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.03.033     Document Type: Review

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