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Applied Physics Letters

Volumn 92, Issue 22, 2008, Pages

Gasless sputtering: Opportunities for ultraclean metallization, coatings in space, and propulsion

(2) Andersson, Joakim a Anders, André a

a LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGED PARTICLES; COPPER; ELECTRONS; IONS; METAL IONS; METALLIZING; PLASMA DENSITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS; VACUUM; VACUUM APPLICATIONS; VACUUM TECHNOLOGY;

COLLECTOR (FLOTATION); COPPER(II) IONS; HIGH VACUUM; METALLIZATION; MULTIPLY CHARGED IONS; PULSED MAGNETRON SPUTTERING; SPUTTER GAS; VACUUM ARCS;

MAGNETRON SPUTTERING;

EID: 44849105741 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.2938414 Document Type: Article

Times cited : (80)

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