Studies of hysteresis effect in reactive HiPIMS deposition of oxides

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 2, 2011, Pages

  Kubart, T ^a,b   Aiempanakit, M ^c   Andersson, J ^a   Nyberg, T ^a   Berg, S ^a   Helmersson, U ^c  

^a UPPSALA UNIVERSITY   (Sweden)

^b CZECH TECHNICAL UNIVERSITY IN PRAGUE   (Czech Republic)

^c LINKÖPING UNIVERSITY   (Sweden)

Author keywords

HiPIMS; Hysteresis; Magnetron sputtering; Oxides deposition; Reactive sputtering

Indexed keywords

AL OXIDE; AVERAGE POWER; DEPOSITED COATINGS; DIRECT CURRENT MAGNETRON SPUTTERING; HIGH-POWER; HIPIMS; HYSTERESIS BEHAVIOUR; HYSTERESIS EFFECT; METAL TARGET; OPTIMUM FREQUENCY; OXIDE MODE; PULSE ON-TIME; REACTIVE PROCESS; STOICHIOMETRIC COMPOUND;

BEHAVIORAL RESEARCH; MAGNETRON SPUTTERING;

HYSTERESIS;

EID: 79959790201     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.01.019     Document Type: Article

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