Transport of ionized metal atoms in high-power pulsed magnetron discharges assisted by inductively coupled plasma

Applied Physics Letters

Volumn 88, Issue 2, 2006, Pages 1-3

  Konstantinidis, S ^a   Dauchot, J P ^a   Ganciu, M ^b   Hecq, M ^c  

^a MATERIA NOVA RESEARCH CENTER   (Belgium)

^b NATIONAL INSTITUTE FOR LASER   (Romania)

^c UNIVERSITY OF MONS   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETRONS; METALLIC COMPOUNDS; SUBSTRATES; THIN FILMS; TITANIUM COMPOUNDS;

COUPLED PLASMA; HIGH-POWER PULSED MAGNETRON; IONIZED METAL ATOMS; THIN-FILM DEPOSITION PROCESS; TITANIUM IONS;

IONIZATION;

EID: 30744468091     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2162671     Document Type: Article

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