Time and energy resolved ion mass spectroscopy studies of the ion flux during high power pulsed magnetron sputtering of Cr in Ar and Ar/N2 atmospheres

Vacuum

Volumn 84, Issue 9, 2010, Pages 1159-1170

  Greczynski, G ^a   Hultman, L ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

Author keywords

High power impulse magnetron sputtering, HIPIMS; High power pulsed magnetron sputtering, HPPMS; Ion energy distribution; Ion flux; Ion mass spectroscopy; Plasma diagnostics

Indexed keywords

HIGH POWER IMPULSE MAGNETRON SPUTTERING, HIPIMS; HIGH POWER PULSED MAGNETRON SPUTTERING; HIGH-POWER; ION ENERGY DISTRIBUTIONS; ION FLUXES; ION MASS SPECTROSCOPY;

ARGON; CHROMIUM; DISTRIBUTION FUNCTIONS; ELECTRIC DISCHARGES; ELECTRIC POWER DISTRIBUTION; FILM GROWTH; ION BEAMS; IONIZATION OF GASES; MAGNETRON SPUTTERING; MAGNETRONS; MASS SPECTROMETERS; MASS SPECTROMETRY; PLASMA DIAGNOSTICS; PLASMA PROBES; PLASMA SOURCES;

IONS;

EID: 77950023121     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2010.01.055     Document Type: Article

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