Target material pathways model for high power pulsed magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 2, 2005, Pages 330-335

  Christie, D J ^a  

^a Advanced Energy Industries Incorporated   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ION CONTENT; METALLIC PLASMA;

DEPOSITION; ION SOURCES; IONIZATION; PLASMA APPLICATIONS; SPECTROSCOPIC ANALYSIS;

MAGNETRON SPUTTERING;

EID: 30844460483     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1865133     Document Type: Article

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