High power impulse magnetron sputtering discharges and thin film growth: A brief review

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 2005, Pages 458-464

  Helmersson, U ^a   Lattemann, M ^a   Alami, J ^a   Bohlmark, J ^a   Ehiasarian, A P ^b   Gudmundsson, J T ^c  

^a LINKÖPING UNIVERSITY   (Sweden)

^b SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

^c UNIVERSITY OF ICELAND   (Iceland)

Author keywords

High power impulse magnetron sputtering discharges; Plasma characterization; Plasma source; Thin film growth

Indexed keywords

ELECTRIC DISCHARGES; ELECTRIC FIELDS; EVAPORATION; FILM GROWTH; IONIZATION; MAGNETIC FIELDS; PHYSICAL VAPOR DEPOSITION; THIN FILMS;

HIGH POWER IMPULSE MAGNETRON SPUTTERING DISCHARGES; PLASMA CHARACTERIZATION; PLASMA SOURCE; THIN FILM GROWTH;

MAGNETRON SPUTTERING;

EID: 33645012830     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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