Morphology of TiN thin films grown on SiO2 by reactive high power impulse magnetron sputtering

Thin Solid Films

Volumn 520, Issue 5, 2011, Pages 1621-1624

  Magnus, F ^a   Ingason, A S ^a,b   Sveinsson, O B ^a   Olafsson, S ^a   Gudmundsson, J T ^a,c  

^a UNIVERSITY OF ICELAND   (Iceland)

^b LINKÖPING UNIVERSITY   (Sweden)

^c SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

High power impulse magnetron sputtering; Ion assisted deposition; Thin films; Titanium nitride

Indexed keywords

CONVENTIONAL DC MAGNETRON SPUTTERING; FILM PROPERTIES; GRAIN SIZE; HIGH-POWER; ION ASSISTED DEPOSITION; STRUCTURAL CHARACTERIZATION; THIN TIN; TIN THIN FILMS;

CRYSTALLITES; DC POWER TRANSMISSION; GRAIN SIZE AND SHAPE; GROWTH TEMPERATURE; ION BEAM ASSISTED DEPOSITION; MAGNETRON SPUTTERING; METALLIC FILMS; SILICON COMPOUNDS; THIN FILMS; TITANIUM; TITANIUM NITRIDE; VAPOR DEPOSITION; X RAY DIFFRACTION;

GRAIN GROWTH;

EID: 82755197893     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.07.041     Document Type: Conference Paper

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