SCOPUS 정보 검색 플랫폼

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

Measurements of deposition rate and substrate heating in a HiPIMS discharge

(5) West, Glen a Kelly, Peter a Barker, Paul a Mishra, Anurag b Bradley, James b

a MANCHESTER METROPOLITAN UNIVERSITY (United Kingdom)

b UNIVERSITY OF LIVERPOOL (United Kingdom)

Author keywords

Coatings; Deposition rate; Films; HiPIMS; Temperature; XRD

Indexed keywords

COATING TEMPERATURE; COATINGS DEPOSITION; DEPOSITION FLUXES; DISCHARGE POWER; FILM PROPERTIES; FREQUENCY-DEPENDENT; HIGH-POWER; MAGNETRON DISCHARGES; POTENTIAL BENEFITS; PROCESS CONDITION; PULSED DC; SUBSTRATE HEATING; TIME-AVERAGED; TITANIUM COATING; XRD;

COATINGS; CRYSTAL STRUCTURE; DC POWER TRANSMISSION; DEPOSITION RATES; TITANIUM; X RAY DIFFRACTION;

SUBSTRATES;

EID: 77954936161 PISSN: 16128850 EISSN: 16128869 Source Type: Journal
DOI: 10.1002/ppap.200931202 Document Type: Conference Paper

Times cited : (41)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.