Time-resolved plasma parameters in the HiPIMS discharge with Ti target in Ar/O2 atmosphere

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 2, 2011, Pages

  Čada, Martin ^a   Hubička, Zdeněk ^a   Adámek, Petr ^a   Klusoň, Jan ^a   Jastrabík, Lubomír ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

HiPIMS; Ion flux; Langmuir probe; Reactive sputtering; Titanium

Indexed keywords

CATHODE VOLTAGES; DISCHARGE CURRENTS; DUTY CYCLES; HIGH-POWER; HIPIMS; ION FLUX; ION FLUXES; LANGMUIRS; LOCAL MAXIMUM; LOW PRESSURES; MAGNETRON SPUTTERING SYSTEMS; PLASMA PARAMETER; PROBE CHARACTERISTICS; REPETITION RATE; TEMPORAL RESOLUTION; THIN-FILM PROPERTIES; TIME-RESOLVED; TITANIUM TARGETS; TOTAL ENERGY FLUX; VOLTAGE DROP; WORKING GAS PRESSURE;

ELECTRIC POTENTIAL; ELECTRON TEMPERATURE; IONS; LANGMUIR PROBES; PLASMA DENSITY; PLASMA DEVICES; PLASMAS; PROBES; TITANIUM;

ELECTRIC DISCHARGES;

EID: 79959775850     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.11.050     Document Type: Article

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