Study of plasma dynamics in a modulated pulsed power magnetron discharge using a time-resolved Langmuir probe

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 29, Issue 1, 2011, Pages

  Meng, L ^a   Cloud, A N ^a   Jung, S ^a   Ruzic, D N ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL TIME; DEGREES OF FREEDOM; ELECTRON DENSITIES; ELECTRON IMPACT-IONIZATION; GROWTH PROCESS; HIGH POWER PULSED MAGNETRON SPUTTERING; MAGNETIC CONFINEMENT; MEASURED PARAMETERS; PLANAR MAGNETRON; PLASMA BEHAVIOR; PLASMA DYNAMICS; PLASMA GENERATOR; PLASMA PROPERTIES; POWER PULSE; PULSE CURRENTS; PULSE FREQUENCIES; PULSE POWER; PULSE WAVEFORMS; PULSED PLASMA; PULSED-POWER; SPUTTERING PROCESS; TEMPORAL EVOLUTION; TIME-RESOLVED; USER CONTROL; VOLTAGE WAVEFORMS;

CARRIER CONCENTRATION; DENSITY FUNCTIONAL THEORY; DYNAMICS; ELECTRIC DISCHARGES; ELECTRON DENSITY MEASUREMENT; ELECTRON TEMPERATURE; IMPACT IONIZATION; IONIZATION OF GASES; LANGMUIR PROBES; MAGNETOHYDRODYNAMICS; PLASMA DEVICES; PLASMA DIAGNOSTICS; PROBES;

PULSE GENERATORS;

EID: 79952024938     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3528940     Document Type: Article

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