Electron energy distributions and plasma parameters in high-power pulsed magnetron sputtering discharges

Plasma Sources Science and Technology

Volumn 18, Issue 2, 2009, Pages

  Pajdarova A D ^a   Vlcek J ^a   Kudlacek P ^a   Lukas J ^a  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON PRESSURE; COPPER FILMS; ELECTRON ENERGIES; ELECTRON ENERGY DISTRIBUTIONS; ENERGY GROUPS; HIGH ENERGY TAILS; HIGH-POWER; HIGH-RATE DEPOSITION; INITIAL STAGES; KINETIC TEMPERATURES; LANGMUIR PROBE MEASUREMENTS; PLANAR TARGET; PLASMA PARAMETER; PLASMA POTENTIAL; PULSE TERMINATION; PULSED DC MAGNETRON SPUTTERING; PULSED MAGNETRON SPUTTERING; REPETITION FREQUENCY; STATE DISCHARGES; TARGET POWER DENSITY; TIME EVOLUTIONS; TIME-RESOLVED; VOLTAGE PULSE;

ARGON; DISSOCIATION; ELECTRIC DISCHARGES; ELECTRIC POWER DISTRIBUTION; ELECTRON ENERGY LEVELS; ELECTRONS; HOT ELECTRONS; MAGNETRON SPUTTERING; MAGNETRONS; PLASMA DENSITY; PLASMA DEPOSITION; PLASMA DEVICES; PLASMAS; TARGETS;

SUBSTRATES;

EID: 67649874722     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/18/2/025008     Document Type: Article

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