An ionization region model for high-power impulse magnetron sputtering discharges

Plasma Sources Science and Technology

Volumn 20, Issue 6, 2011, Pages

  Raadu, M A ^a   Axnas I ^a   Gudmundsson, J T ^b,c   Huo, C ^a   Brenning, N ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b SHANGHAI JIAO TONG UNIVERSITY   (China)

^c UNIVERSITY OF ICELAND   (Iceland)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM TARGET; CHARGED IONS; CURRENT WAVEFORMS; DEGREE OF IONIZATION; DEVICE GEOMETRIES; ELECTRIC PULSE; EXCITATION RATE; EXPERIMENTAL DATA; HIGH-POWER; INPUT PARAMETER; ION LOSS; ISOTROPIC DIFFUSION; LONG PULSE; MODELING TOOL; PLASMA DISCHARGE; POWER EFFICIENCY; SECONDARY EMISSION YIELD; SELECTED EXAMPLES; TARGET MATERIALS; TEMPORAL VARIATION; THERMAL ELECTRON; TIME-DEPENDENT; WORKING GAS;

ARGON; CARRIER CONCENTRATION; ELECTRIC DISCHARGES; ELECTRON DENSITY MEASUREMENT; ELECTRON TEMPERATURE; ELECTRONS; GASES; THERMIONIC EMISSION;

IONIZATION OF GASES;

EID: 82755162844     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/20/6/065007     Document Type: Article

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