Investigation of plasma characteristics in an unbalanced magnetron sputtering system

Plasma Physics Reports

Volumn 35, Issue 5, 2009, Pages 399-408

  Solov'ev, A A ^a   Sochugov, N S ^a   Oskomov, K V ^a   Rabotkin, S V ^a  

^a INSTITUTE OF HIGH CURRENT ELECTRONICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 67649736553     PISSN: 1063780X     EISSN: None     Source Type: Journal    
DOI: 10.1134/S1063780X09050055     Document Type: Article

References (21)

1. X. B. Zhang J. Q. Xiao Z. L. Pei 2007 J. Vac. Sci. Technol. A 25 209
2. I. Petrov F. Abibi J. E. Greene 1992 J. Vac. Sci. Technol. A 10 3283
3. I. Ivanov P. Kazansky L. Hultman 1994 J. Vac. Sci. Technol. A 12 314
4. S. M. Rossnagel H. R. Kaufman 1986 J. Vac. Sci. Technol. A 4 1822
5. T. E. Sheridan J. Goree 1989 J. Vac. Sci. Technol. A 7 1014
6. I. Petrov I. Ivanov V. Orlinov J. Kourtev 1990 Contrib. Plasma Phys. 30 223
7. P. Spatenka J. Vlcek J. Blazek 1999 Vacuum 55 165
8. L. Gu M. A. Lieberman 1988 J. Vac. Sci. Technol. A 6 2960
9. S. Miyake N. Shimura T. Makabe A. Itoh 1992 J. Vac. Sci. Technol. A 10 1135
10. C. Engström T. Berlind J. Birch 2000 Vacuum 56 107
11. I. Pickova A. Marek M. Tichy P. Kudrna 2006 Czech. J. Phys. 56 1002
12. B. Window N. Savvides 1986 J. Vac. Sci. Technol. A 4 453
13. www.gencoa.com.
14. B. Window G. L. Harding 1990 J. Vac. Sci. Technol. A 8 1277
15. D. J. Field S. K. Dew R. E. Burrell 2002 J. Vac. Sci. Technol. A 20 2032
16. S. Kadlec C. Quaeyhaegens G. Knuyt L. M. Stals 1997 Surf. Coat. Technol. 89 177
17. H. Bingsen C. Zhou 1992 Surf. Coat. Technol. 50 111
18. J. W. Bradley R. D. Arnell D. G. Armour 1997 Surf. Coat. Technol. 97 538
19. S.-H. Seo J.-H. In H.-Y. Chang 2004 Plasma Sources Sci. Technol. 13 409
20. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994), p. 373.
21. M. Misina L. R. Shaginyan M. Macek P. Panjan 2001 Surf. Coat. Technol. 142-144 348