Crystalline alumina deposited at low temperatures by ionized magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 3, 1997, Pages 1084-1088

  Schneider, Jochen M ^a   Sproul, William D ^a   Voevodin, Andrey A ^b   Matthews, Allan ^c  

^a NORTHWESTERN UNIVERSITY   (United States)

^b AIR FORCE RESEARCH LABORATORY   (United States)

^c UNIVERSITY OF HULL   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000756838     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580434     Document Type: Article

References (19)

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