SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 625-629

Deposition of Ti1-xAlxN using bipolar pulsed dual magnetron sputtering

(3) Åstrand, Maria a Selinder, T I a Sjostrand M E a

a Sandvik Tooling (Sweden)

Author keywords

Magnetron sputtering; Pulsed; Titanium aluminium nitride

Indexed keywords

AMORPHOUS MATERIALS; CHARACTERIZATION; COATINGS; DEPOSITION; ELASTIC MODULI; HARDNESS; MAGNETRON SPUTTERING; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PRESSURE EFFECTS; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

BIPOLAR PULSED DUAL MAGNETRON SPUTTERING; NANOLAYERED COATINGS; NITROGEN PARTIAL PRESSURE; TITANIUM ALUMINIUM NITRIDE;

TITANIUM COMPOUNDS;

COATING;

EID: 24644511165 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.01.016 Document Type: Article

Times cited : (16)

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