Angular-resolved energy flux measurements of a dc- and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphere

Journal of Physics D: Applied Physics

Volumn 44, Issue 11, 2011, Pages

  Leroy, W P ^a   Konstantinidis, S ^b   Mahieu, S ^a   Snyders, R ^b,c   Depla, D ^a  

^a GHENT UNIVERSITY   (Belgium)

^b UNIVERSITY OF MONS   (Belgium)

^c MATERIA NOVA RESEARCH CENTER   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ANGULAR PROFILE; DC MODE; ENERGY FLUX MEASUREMENTS; ENERGY FLUXES; PROCESS CONDITION; PULSE LENGTH; REACTIVE ATMOSPHERES; SPUTTERING POWER; TITANIUM TARGETS; TOTAL ENERGY FLUX;

CYLINDERS (SHAPES); DEPOSITION RATES; MAGNETRONS; METALLIC COMPOUNDS; ROTATION; TITANIUM; TITANIUM OXIDES;

DC POWER TRANSMISSION;

EID: 79952712955     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/44/11/115201     Document Type: Article

References (38)

1. McKelvey H E 1982 Magnetron cathode sputtering apparatus US Patent 4,356,073
2. Wright M and Beardow T 1986 J. Vac. Sci. Technol. A 4 388-92
3. De Bosscher W and Lievens H 1999 Thin Solid Films 351 15-20
4. Li X Y, Depla D, Leroy W P, Haemers J and De Gryse R 2008 J. Phys. D: Appl. Phys. 41 035203
5. Mahieu S, Leroy W P, Depla D, Schreiber S and Moller W 2008 Appl. Phys. Lett. 93 061501
6. Depla D, Li X Y, Mahieu S, Van Aeken K, Leroy W P, Haemers J, De Gryse R and Bogaerts A 2010 J. Appl. Phys. 107 113307
7. Kouznetsov V, Macak K, Schneider J M, Helmersson U and Petrov I 1999 Surf. Coat. Technol. 122 290-3
8. Helmersson U, Lattemann M, Bohlmark J, Ehiasarian A P and Gudmundsson J T 2006 Thin Solid Films 513 1-24
9. Hovsepian P E, Ehiasarian A P, Deeming A and Schimpf C 2008 Vacuum 82 1312-7
10. Sarakinos K, Alami J and Konstantinidis S 2010 Surf. Coat. Technol. 204 1661-84
11. Leroy W P, Mahieu S, Depla D and Ehiasarian A P 2010 J. Vac. Sci. Technol. A 28 108-11
12. Mahieu S and Depla D 2009 J. Phys. D: Appl. Phys. 42 053002
13. Kersten H, Deutsch H, Steffen H, Kroesen G M W and Hippler R 2001 Vacuum 63 385-431
14. Depla D and De Gryse R 2004 Surf. Coat. Technol. 183 184-9
15. Berg S, Nyberg T and Kubart T 2008 Reactive Sputter Deposition ed D Depla and S Mahieu (Berlin: Springer)
16. Depla D, Haemers J, Buyle G and De Gryse R 2006 J. Vac. Sci. Technol. A 24 934-8
17. Ganciu M, Konstantinidis S, Paint Y, Dauchot J P, Hecq M, de Poucques L, Vasina P, Mesko M, Imbert J C, Bretagne J and Touzeau M 2005 J. Optoelectron. Adv. Mater. 7 2481-4
18. West G, Kelly P, Barker P, Mishra A and Bradley J 2009 Plasma Process. Polym. 6 S543-S7
19. Stahl M, Trottenberg T and Kersten H 2010 Rev. Sci. Instrum. 81 023504
20. Wolter M, Stahl M and Kersten H 2009 Plasma Process. Polym. 6 S626-30
21. Konstantinidis S, Dauchot J P, Ganciu M, Ricard A and Hecq M 2006 J. Appl. Phys. 99 013307
22. Lundin D, Brenning N, Jadernas D, Larsson P, Wallin E, Lattemann M, Raadu M A and Helmersson U 2009 Plasma Sources Sci. Technol. 18 045008
23. Saraiva M, Georgieva V, Mahieu S, Van Aeken K, Bogaerts A and Depla D 2010 J. Appl. Phys. 107 034902
24. Ohring M 2002 Materials Science of Thin Films (London: Academic)
25. Konstantinidis S, Gaboriau F, Gaillard M, Hecq M and Ricard A 2008 Optical plasma diagnostics during reactive magnetron sputtering in Reactive Sputter Deposition ed D Depla and S Mahieu (Berlin: Springer) p 301
26. Benzeggouta D, Hugon M C, Bretagne J and Ganciu M 2009 Plasma Sources Sci. Technol. 18 045025
27. Van Aeken K, Mahieu S and Depla D 2008 J. Phys. D: Appl. Phys. 41 205307
28. Rossnagel S M 1988 J. Vac. Sci. Technol. A 6 19-24
29. Anders A and Yushkov G Y 2009 J. Appl. Phys. 105 073301
30. Lundin D, Larsson P, Wallin E, Lattemann M, Brenning N and Helmersson U 2008 Plasma Sources Sci. Technol. 17 035021
31. Konstantinidis S, Dauchot J P, Ganciu M and Hecq M 2006 Appl. Phys. Lett. 88 021501
32. Horwat D and Anders A 2008 J. Phys. D: Appl. Phys. 41 135210
33. Lundin D, Stahl M, Kersten H and Helmersson U 2009 J. Phys. D: Appl. Phys. 42 185202
34. Ehiasarian A P, Wen J G and Petrov I 2007 J. Appl. Phys. 101 054301
35. Mahieu S, Leroy W P, Van Aeken K and Depla D 2009 J. Appl. Phys. 106 093302
36. Mraz S and Schneider J M 2006 J. Appl. Phys. 100 023503
37. Sarakinos K, Music D, Mraz S, Baben M T, Jiang K, Nahif F, Braun A, Zilkens C, Konstantinidis S, Renaux F, Cossement D, Munnik F and Schneider J M 2010 J. Appl. Phys. 108 014904
38. Bohlmark J, Helmersson U, VanZeeland M, Axnas I, Alami J and Brenning N 2004 Plasma Sources Sci. Technol. 13 654-61