The evolution of the IEDFs in a low-pressure HiPIMS discharge

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 2, 2011, Pages

  Poolcharuansin, P ^a   Bradley, J W ^a  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

Author keywords

HiPIMS; Langmuir probe; Low pressure sputtering; Mass spectrometry

Indexed keywords

A-CARBON; DC POWER SUPPLIES; ENERGETIC ION; ENERGY PEAKS; ENERGY-RESOLVED MASS SPECTROMETER; HIGH ENERGY; HIGH-POWER; HIPIMS; ION ENERGY DISTRIBUTION FUNCTIONS; LANGMUIRS; LOW ENERGIES; LOW POWER; LOW-ENERGY PEAKS; LOW-PRESSURE CONDITIONS; LOW-PRESSURE SPUTTERING; MEAN-FREE PATH; OPERATING PRESSURE; PEAK POWER DENSITIES; PLASMA IGNITION; POWER SUPPLY; PULSE WIDTH; REPETITION RATE; TIME-AVERAGED; TIME-RESOLVED; WORKING PRESSURES;

DC POWER TRANSMISSION; DISTRIBUTION FUNCTIONS; HIGH ENERGY PHYSICS; MASS SPECTROMETERS; MASS SPECTROMETRY; ORIFICES; PULSE REPETITION RATE;

ELECTRIC DISCHARGES;

EID: 79959771791     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.12.023     Document Type: Article

References (32)

1. Kouznetsov V., Macak K., Schneider J.M., Helmersson U., Petrov I. Surf. Coat. Technol. 1999, 122:290.
2. Bohlmark J., Lattemann M., Gudmundsson J.T., Ehiasarian A.P., Aranda Gonzalvo Y., Brenning N., Helmersson U. Thin Solid Films 2006, 515:1522.
3. Ehiasarian A.P., Hovsepian P.E., Hultman L., Helmersson U. Thin Solid Films 2004, 457:270.
4. Vasina P., Mesko M., Imbert J.C., Ganciu M., Boisse-Laporte C., de Poucques L., Touzeau M., Pagnon D., Bretagne J. Plasma Sources Sci. Technol. 2007, 16:501.
5. Benzeggouta D., Hugon M.C., Bretagne J., Ganciu M. Plasma Sources Sci. Technol. 2009, 18:045025.
6. Alami J., Sarakinos K., Uslu F., Wuttig M. J. Phys. D Appl. Phys. 2009, 42:015304.
7. Song D., Widenborg P., Chin W., Aberle A.G. Sol. Energ. Mat. Sol. Cells 2002, 73:1.
8. Thornton J.A. J. Vac. Sci. Technol. 1974, 11:666.
9. Anders A. Thin Solid Films 2010, 518:4087.
10. Gudmundsson J.T., Alami J., Helmersson U. Surf. Coat. Technol. 2002, 161:249.
11. Andersson J., Anders A. Appl. Phys. Lett. 2008, 92:221503.
12. Anders A., Yushkov G.Y. J. Appl. Phys. 2009, 105:073301.
13. Ganciu M., Konstantinidis S., Paint Y., Dauchot J.P., Hecq M., de Poucques L., Vasina P., Mesko M., Imbert J.C., Bretagne J., Touzeau M. J. Optoelectron Adv. M. 2005, 7:2481.
14. Vasina P., Mesko M., Ganciu M., Bretagne J., Boisse-Laporte C., De Poucques L., Touzeau M. Europhys. Lett. 2005, 72:390.
15. Poolcharuansin P., Liebig B., Bradley J. IEEE Trans. Plasma Sci. 2010, 38:3007.
16. Vlcek J., Kudlacek P., Burcalova K., Musil J. Europhys. Lett. 2007, 77:45002.
17. Kudlacek P., Vlcek J., Burcalova K., Lukas J. Plasma Sources Sci. Technol. 2008, 17:025010.
18. Burcalova K., Hecimovic A., Ehiasarian A.P. J. Phys. D Appl. Phys. 2008, 41:115306.
19. Hecimovic A., Burcalova K., Ehiasarian A.P. J. Phys. D Appl. Phys. 2008, 41:095203.
20. Hecimovic A., Ehiasarian A.P. J. Phys. D Appl. Phys. 2009, 42:135209.
21. Lin J., Moore J.J., Sproul W.D., Mishra B., Rees J.A., Wu Z., Chistyakov R., Abraham B. Surf. Coat. Technol. 2009, 203:3676.
22. Private communication with the manufacturer of the mass spectrometer, Hiden analytical, UK.
23. Yushkov G.Y., Anders A. IEEE Trans. Plasma Sci. 2010, 38:3028.
24. Lundin D., Brenning N., Jadernas D., Larsson P., Wallin E., Lattemann M., Raadu M.A., Helmersson U. Plasma Sources Sci. Technol. 2009, 18:045008.
25. Poolcharuansin P., Bradley J.W. Plasma Sources Sci. Technol. 2010, 19:025010.
26. Principles of Plasma Discharges and Materials Processing 2005, Wiley-Interscience, NJ. M.A. Lieberman, A.J. Lichtenberg (Eds.).
27. Gudmundsson J.T., Sigurjonsson P., Larsson P., Lundin D., Helmersson U. J. Appl. Phys. 2009, 105:123302.
28. Bradley J.W., Welzel T. J. Phys. D Appl. Phys. 2009, 42:093001.
29. Backer H., Bradley J.W., Kelly P.J., Arnell R.D. J. Phys. D Appl. Phys. 2001, 34:2709.
30. Thornton J.A., Hoffman D.W. Thin Solid Films 1989, 171:5.
31. Weichart J., Elghazzali M., Kadlec S., Ehiasarian A.P. Proceeding of the 52nd Annual Technical Conference of the Society of Vacuum Coaters, May 9-14, 2009, Santa Clara, CA, USA 2009, 201.
32. Hecimovic A., Ehiasarian A.P. J. Appl. Phys. 2010, 108:063301.