SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 206, Issue 6, 2011, Pages 1155-1159

On surface temperatures during high power pulsed magnetron sputtering using a hot target

(3) Tesar J a Martan, J a Rezek, J a

a UNIVERSITY OF WEST BOHEMIA (Czech Republic)

Author keywords

High power pulsed magnetron sputtering; Hot target; Infrared camera; Surface temperature measurement; Titanium

Indexed keywords

EROSION AND DEPOSITION RATES; EROSION ZONES; HIGH POWER PULSED MAGNETRON SPUTTERING; HOT TARGET; INFRA-RED CAMERAS; INFRARED CAMERA; MAXIMUM TEMPERATURE; PHASE CHANGE; PULSE CURRENTS; PULSE REPETITION FREQUENCIES; SOLID STATE PHASE TRANSFORMATION; SURFACE TEMPERATURE MEASUREMENT; SURFACE TEMPERATURES; TARGET POWER DENSITY; TEMPORAL EVOLUTION; TITANIUM THIN FILMS;

ATMOSPHERIC TEMPERATURE; EROSION; MAGNETRON SPUTTERING; MELTING; SURFACE PROPERTIES; TEMPERATURE MEASUREMENT; TITANIUM;

TEMPERATURE INDICATING CAMERAS;

EID: 80055101342 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2011.08.005 Document Type: Article

Times cited : (48)

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