High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering

Journal of Applied Physics

Volumn 102, Issue 11, 2007, Pages

  Anders, Andŕ ^a   Andersson, Joakim ^a   Ehiasarian, Arutiun ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC DISCHARGES; ELECTRON TRAPS; METAL IONS;

CHARGED IONS; SECONDARY ELECTRONS; SUSTAINED SELF-SPUTTERING;

MAGNETRON SPUTTERING;

EID: 37149012656     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2817812     Document Type: Article

References (38)

1. A. P. Ehiasarian, J. G. Wen, and I. Petrov, J. Appl. Phys. 101, 054301 (2007).
2. A. P. Ehiasarian, W. D. Munz, L. Hultman, U. Helmersson, and I. Petrov, Surf. Coat. Technol. 163-164, 267 (2003).
3. J. S. Colligon, J. Vac. Sci. Technol. A 13, 1649 (1995).
4. O. R. Monteiro, Annu. Rev. Mater. Sci. 31, 111 (2001).
5. A. Anders, J. Phys. D 40, 2272 (2007).
6. N. Hosokawa, T. Tsukada, and T. Misumi, J. Vac. Sci. Technol. 14, 143 (1977).
7. N. Hosokawa, T. Tsukada, and H. Kitahara, Proceedings of the Eight International Vacuum Congress, Le Vide, Cannes, France, edited by, F. Abeles, pp. 11-14 (1980).
8. W. M. Posadowski, Thin Solid Films 392, 201 (2001).
9. W. M. Posadowski and Z. Radzimski, J. Vac. Sci. Technol. A 11, 2980 (1993).
10. S. P. Bugaev, N. N. Koval, N. S. Sochugov, and A. N. Zakharov, XVIIth International Symposium on Discharges and Electrical Insulation in Vacuum, Berkeley, CA, edited by, S. Anders, and, A. Anders, (LBNL, California, 1996), pp. 1074-1076.
11. V. Kouznetsov, K. Macak, J. M. Schneider, U. Helmersson, and I. Petrov, Surf. Coat. Technol. 122, 290 (1999).
12. J. Vlček, P. Kudláček, K. Burcalová, and J. Musil, J. Vac. Sci. Technol. A 25, 42 (2007).
13. A. P. Ehiasarian, R. New, W.-D. Münz, L. Hultman, U. Helmersson, and V. Kouznetsov, Vacuum 65, 147 (2002).
14. J. Bohlmark, J. Alami, C. Christou, A. Ehiasarian, and U. Helmersson, J. Vac. Sci. Technol. A 23, 18 (2005).
15. U. Helmersson, M. Lattemann, J. Bohlmark, A. P. Ehiasarian, and J. T. Gudmundsson, Thin Solid Films 513, 1 (2006).
16. B. P. Wood, D. J. Rej, A. Anders, I. G. Brown, R. J. Faehl, S. M. Malik, and C. P. Munson, in Handbook of Plasma Immersion Ion Implantation and Deposition, edited by, A. Anders, (Wiley, New York, 2000), Chap..
17. A. T. Forrester, Large Ion Beams (Wiley, New York, 1988).
18. A. Anders, Surf. Coat. Technol. 183, 301 (2004).
19. M. A. Lieberman, in Handbook of Plasma Immersion Ion Implantation and Deposition, edited by, A. Anders, (Wiley, New York, 2000).
20. F. F. Chen, Plasma Physics and Controlled Fusion (Plenum, New York, 1984).
21. J. F. Ziegler and J. Biersack, Monte Carlo code SRIM2006.02, 2006 (http://srim.org/).
22. H. Winter, F. Aumayr, and G. Lakits, Nucl. Instrum. Methods Phys. Res. B 58, 301 (1991).
23. H. Winter, H. Eder, F. Aumayr, J. Lorincik, and Z. Sroubek, Nucl. Instrum. Methods Phys. Res. B 182, 15 (2001).
24. R. A. Baragiola, E. V. Alonso, J. Ferron, and A. Oliva-Florio, Surf. Sci. 90, 240 (1979).
25. J. Lörinčík, Z. Šroubek, H. Eder, F. Aumayr, and H. Winter, Phys. Rev. B 62, 16116 (2000).
26. M. Kaminsky, Atomic and Ionic Impact Phenomena on Metal Surfaces (Springer-Verlag, Berlin, 1965).
27. Sputtering by Particle Bombardment I, edited by, R. Behrisch, (Springer, Berlin, 1981).
28. W. D. Westwood, Sputter Deposition (AVS, New York, 2003).
29. Ionized Physical Vapor Deposition, edited by, J. A. Hopwood, (Academic, San Diego, CA, 2000).
30. E. V. Barnat and T.-M. Lu, Pulsed Sputtering and Pulsed Bias Sputtering (Kluwer Academic, Boston, 2003).
31. D. Bohm, in The Characteristics of Electrical Discharges in Magnetic Fields, edited by, A. Guthrie, and, R. K. Wakerling, (McGraw-Hill, New York, 1949), pp. 77-86.
32. S. M. Rossnagel, J. Vac. Sci. Technol. A 6, 19 (1988).
33. K. B. Gylfason, J. Alami, U. Helmersson, and J. T. Gudmundsson, J. Phys. D 38, 3417 (2005).
34. S. M. Rossnagel and H. R. Kaufman, J. Vac. Sci. Technol. A 5, 88 (1987).
35. J. Bohlmark, U. Helmersson, M. VanZeeland, I. Axnas, J. Alami, and N. Brenning, Plasma Sources Sci. Technol. 13, 654 (2004).
36. A. Vetushka and J. W. Bradley, J. Phys. D 40, 2037 (2007).
37. H. Eder, W. Messerschmidt, H. Winter, and F. Aumayr, J. Appl. Phys. 87, 8198 (2000).
38. K. Macák, V. Kouznetsov, J. Schneider, U. Helmersson, and I. Petrov, J. Vac. Sci. Technol. A 18, 1533 (2000).