High-power pulsed sputtering using a magnetron with enhanced plasma confinement

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 1, 2007, Pages 42-47

  Vlček, Jaroslav ^a   Kudláček, Pavel ^a   Burcalová, Kristýna ^a   Musil, Jindr̂ich ^a  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

IONIZATION; MAGNETRONS; METALLIC FILMS; PLASMAS; SUBSTRATES;

IONIZED FRACTION; REPETITION FREQUENCY; SPUTTERED COPPER ATOMS; WATER COOLED PLANAR COPPER;

MAGNETRON SPUTTERING;

EID: 33846228869     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2388954     Document Type: Article

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